Understanding silica-supported metal catalysts: Pd/silica as a case study

Catalysis Today

Volumn 85, Issue 2-4, 2003, Pages 113-124

  Min, B K ^a   Santra, A K ^a,b   Goodman, D W ^a  

^a TEXAS A AND M UNIVERSITY   (United States)

^b HALLIBURTON   (United States)

Author keywords

Alloying and sintering; Films; Inter diffusion; Metal clusters; Metal support interaction; Oxide; Palladium; Silica; Silicide; SMSI; STM; Supported catalysts

Indexed keywords

CATALYST SUPPORTS; FILM GROWTH; INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); LOW ENERGY ELECTRON DIFFRACTION; MOLECULAR ORIENTATION; MORPHOLOGY; PALLADIUM; SCANNING TUNNELING MICROSCOPY; THERMAL EFFECTS;

ATOMIC VACANCIES;

SILICA;

EID: 0141919286     PISSN: 09205861     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0920-5861(03)00380-8     Document Type: Article

References (56)

1. S.A. Stevenson, R.T.K. Baker, J.A. Dumesic, E. Ruckenstein (Eds.), Metal-Support Interactions in Catalysis, Sintering, and Redispersion, Catalysis Series, Van Nostrand Reinhold, New York, 1987.
2. Valden M., Lai X., Goodman D.W. Science. 281:1998;5383.
3. Haruta M. Catal. Today. 36:1997;153.
4. Tauster S.J., Fung S.C., Garten R.L. J. Am. Chem. Soc. 100:1978;170.
5. Tauster S.J., Fung S.C., Baker R.T.K., Horsley J.A. Science. 221:1981;1121.
6. Katrib A., Petit C., Legare P., Hilaire L., Maire G. Surf. Sci. 189-190:1987;886.
7. Lamber R., Jaeger N., Schulz-Ekloff G. Surf. Sci. 227:1990;268.
8. Lamber R., Romanowski W. J. Catal. 105:1987;213.
9. Chang T.-C., Chen J.-J., Yeh C.-T. J. Catal. 96:1985;51.
10. Pretorius R., Harris J.M., Nicolet M.-A. Solid-State Electron. 21:1978;667.
11. Chen M., Schmidt L.D. J. Catal. 55:1978;348.
12. Xu X., He J.-W., Goodman D.W. Surf. Sci. 284:1993;103.
13. Xu X., Goodman D.W. Appl. Phys. Lett. 61:1992;1799.
14. Xu X., Szanyi J., Xu Q., Goodman D.W. Catal. Today. 21:1994;57.
15. Powell B.R., Whittington S.E. J. Catal. 81:1983;382.
16. Van den Oetelaar L.C.A., Partridge A., Toussaint S.L.G., Flipse C.F.J., Brongersma H.H. J. Phys. Chem. B. 102:1998;9541.
17. Scott D.W., Lau S.S. Thin Solid Films. 104:1983;227.
18. Schleich B., Schmeisser D., Gopel W. Surf. Sci. 191:1987;367.
19. Anton R., Neukirch U., Harsdorff M. Phys. Rev. B. 36:1987;7422.
20. Anton R. Thin Solid Films. 118:1984;293.
21. Mayer J.T., Lin R.F., Garfunkel E. Surf. Sci. 265:1992;102.
22. Zhou J.B., Gustafsson T., Lin R.F., Garfunkel E. Surf. Sci. 284:1993;67.
23. Goodnick S.M., Fathipour M., Ellsworth D.L., Wilmsen C.W. J. Vac. Sci. Technol. 18:1981;949.
24. Lamber R. Thin Solid Films. 128:1985;L29.
25. Praliaud H., Martin G.A. J. Catal. 72:1981;394.
26. Dallaporta H., Liehr M., Lewis J.E. Phys. Rev. B. 41:1990;5075.
27. Liehr M., Dallaporta H., Lewis J.E. Appl. Phys. Lett. 53:1988;589.
28. Van den Oetelaar L.C.A., Van den Oetelaar R.J.A., Partridge A., Flipse C.F.J., Brongersma H.H. Appl. Phys. Lett. 74:1999;2954.
29. B.K. Min, A.K. Santra, D.W. Goodman, J. Vac. Sci. Technol., in press.
30. S.M. Sze, VLSI Technology, McGraw-Hill, New York, 1983.
31. Liehr M., Lefakis H., Legoues F.K., Rubloff G.W. Phys. Rev. B. 33:1986;5517.
32. Shen L.-L., Karpinksi Z., Sachtler W.M.H. J. Phys. Chem. 93:1989;4890.
33. Juszczyk W., Karpinski Z. J. Catal. 117:1989;519.
34. Lai X., St. Clair T.P., Valden M., Goodman D.W. Prog. Surf. Sci. 59:1998;25.
35. Moss R.L., Pope D., Davis B.J., Edwards D.H. J. Catal. 58:1979;206.
36. Martin G.A., Dalmon J.A. J. Catal. 75:1982;233.
37. Martin G.A., Dalmon J.A. React. Kinet. Catal. Lett. 16:1981;325.
38. Martin G.A., Dutartre R., Dalmon J.A. React. Kinet. Catal. Lett. 16:1981;329.
39. Primet M., Dalmon J.A., Martin G.A. J. Catal. 46:1977;25.
40. Wynblatt P., Gjostein N.A. Acta Metall. 24:1976;1165.
41. Bartholomew C.H. Appl. Catal. A. 107:1993;1.
42. Poppa H. Thin Solid Films. 34:1976;94.
43. Chen J.J., Ruckenstein E. J. Catal. 69:1981;254.
44. Xu X., Goodman D.W. J. Phys. Chem. 97:1993;683.
45. Xu X., Vesecky S.M., Goodman D.W. Science. 258:1992;788.
46. Xu X., Vesecky S.M., He J.-W., Goodman D.W. J. Vac. Sci. Technol. A. 11:1993;1930.
47. Santra A.K., Min B.K., Goodman D.W. Surf. Sci. 515:2002;L475.
48. Santra A.K., Min B.K., Goodman D.W. Surf. Sci. 513:2002;L441.
49. E. Ozensoy, B.K. Min, D.W. Goodman, J. Phys. Chem. B., submitted for publication.
50. Kim Y.D., Wei T., Goodman D.W. Langmuir. 19:2003;354.
51. Bogicevic A., Jennison D.R. Surf. Sci. 515:2002;L481.
52. Carriere B., Lang B. Surf. Sci. 64:1977;209.
53. Kampshoff E., Walchli N., Kern K. Surf. Sci. 406:1998;117.
54. Walchli N., Kampshoff E., Menck A., Kern K. Surf. Sci. 382:1997;L705.
55. Lyubinetsky I.V., Adamchuk V.K. Thin Solid Films. 288:1996;182.
56. Tanaka K., Furui K., Yamada M. J. Phys. Soc. Jpn. 64:1995;4790.