Impact of the transient formation of molecular hydrogen on the microcrack nucleation and evolution in H-implanted Si (001)

Journal of Applied Physics

Volumn 103, Issue 2, 2008, Pages

  Personnic, S ^a   Bourdelle, K K ^a   Letertre, F ^a   Tauzin, A ^b   Cherkashin, N ^c   Claverie, A ^c   Fortunier, R ^d   Klocker, H ^d  

^a PARC TECHNOLOGIQUE DES FONTAINES   (France)

^b CEA LETI   (France)

^c CEMES CNRS   (France)

^d ECOLE DES MINES DE SAINT ETIENNE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; MICROCRACKS; MICROMETERS; MOLECULAR STRUCTURE; NUCLEATION; SILICON COMPOUNDS;

MICROCRACK NUCLEATION; TRANSIENT FORMATION;

HYDROGEN;

EID: 38849194829     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2829807     Document Type: Article

References (22)

1. M. Bruel, Electron. Lett. ELLEAK 0013-5194 10.1049/el:19950805 31, 1201 (1995).
2. M. K. Weldon, V. E. Marsico, Y. J. Chabal, A. Agarwal, D. J. Eaglesham, J. Sapjeta, W. L. Brown, D. C. Jacobson, Y. Caudano, S. B. Christman, and E. E. Chaban, J. Vac. Sci. Technol. B JVTBD9 0734-211X 10.1116/1.589416 15, 1065 (1997).
3. N. M. Johnson, F. A. Ponce, R. A. Street, and R. J. Nemanich, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.35.4166 35, 4166 (1987).
4. J. Grisolia, G. Ben Assayag, A. Claverie, B. Aspar, C. Lagahe, and L. Laanab, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.125606 76, 852 (2000).
5. B. Aspar, H. Moriceau, E. Jalaguier, C. Lagahe, A. Soubie, B. Biasse, A. M. Papon, A. Claverie, J. Grisolia, G. Benassayag, F. Leterte, O. Rayssac, T. Barge, C. Maleville, and B. Ghyselen, J. Electron. Mater. JECMA5 0361-5235 10.1007/s11664-001-0067-2 30, 834 (2001).
6. S. Personnic, A. Tauzin, K. K. Bourdelle, F. Letertre, N. Kernevez, F. Laugier, N. Cherkashin, A. Claverie, and R. Fortunier, AIP Conf. Proc. APCPCS 0094-243X 10.1063/1.2401463 866, 65 (2006).
7. P. Holliger, F. Laugier, and J. C. Dupuy, Surf. Interface Anal. SIANDQ 0142-2421 10.1002/sia.1341 34, 472 (2002).
8. GRAMS software, http://www.thermo.com/com/CDA/.
9. B. Bech Nielsen, L. Hoffmann, M. Budde, R. Jones, J. Goss, and S. Öberg, Mater. Sci. Forum MSFOEP 0255-5476 196-201, 933 (1995).
10. M. Shinohara, T. Kuwano, Y. Akama, Y. Kimura, and M. Niwano, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.1524146 21, 25 (2003).
11. M. Suezawa, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 10.1143/JJAP.37.L806 37, L806 (1998).
12. S. P. Timoshenko, Resistance Des Mat́riaux, Tome II (Dunod, Paris, 1981).
13. C. M. Varma, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.120378 71, 3519 (1997).
14. S. M. Myers, D. M. Follstaedt, H. J. Stein, and W. R. Wampler, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.47.13380 47, 13380 (1993).
15. P. Deak, L. C. Snyder, and J. W. Corbett, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.37.6887 37, 6887 (1988).
16. S. K. Estreicher, J. L. Hastings, and P. A. Fedders, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.57.R12663 57, R12 663 (1998).
17. M. Kitajima, K. Ishioka, and S. Tateishi, Mater. Sci. Eng., B MSBTEK 0921-5107 10.1016/S0921-5107(98)00266-9 58, 13 (1999).
18. K. Ishioka, M. Kitajima, S. Tateishi, K. Nakanoya, N. Fukata, T. Mori, K. Murakami, and S. Hishita, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.60. 10852 60, 10852 (1999).
19. T. Mori, K. Otsuka, N. Umehara, K. Ishioka, M. Kitajima, S. Hishita, and K. Murakami, Physica B PHYBE3 0921-4526 308-310, 171 (2001).
20. W. Düngen, R. Job, Y. Ma, Y. L. Huang, T. Mueller, W. R. Fahrner, L. O. Keller, J. T. Horstmann, and H. Fieldler, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2227262 100, 034911 (2006).
21. F. A. Reboredo, M. Ferconi, and S. T. Pantelides, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.82.4870 82, 4870 (1999).
22. L. B. Freund, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.119219 70, 3519 (1997).