Optical lithography into the millennium: Sensitivity to aberrations, vibration and polarization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Flagello, Donis G ^a   Mulkens, Jan ^a   Wagner, Christian ^a  

^a ASML US Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; IMAGE QUALITY; LENSES; LIGHT POLARIZATION; VIBRATIONS (MECHANICAL);

RAYLEIGH CRITERIA;

PHOTOLITHOGRAPHY;

EID: 0033714189     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)