Validity of the diffused aerial image model: An assessment based on multiple test cases

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 III, Issue , 2003, Pages 1536-1543

  Fuard, D ^a   Besacier, M ^a   Schiavone, P ^a  

^a Lab Technol de la Microelectron   (France)

Author keywords

Aerial image; CD prediction; Diffusion OPC; Gaussian noise; Lithography simulation; Simplified resist models

Indexed keywords

COMPUTER SIMULATION; ERROR ANALYSIS; IMAGE ANALYSIS; LIGHTING; MASKS; MATHEMATICAL MODELS; RELIABILITY;

CRITICAL DIMENSIONS; DIFFUSED AERIAL IMAGE MODEL; GAUSSIAN NOISE; LITHOGRAPHY MODELING; LITHOGRAPHY SIMULATION; MULTIPLE TEST; SIMPLIFIED RESIST MODELS;

PHOTOLITHOGRAPHY;

EID: 0141498239     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485516     Document Type: Conference Paper

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