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Volumn 4691 II, Issue , 2002, Pages 1266-1277

Assessment of different simplified resist models

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CONVOLUTION; IMAGE ANALYSIS; MATHEMATICAL MODELS; SPURIOUS SIGNAL NOISE;

EID: 0036414478     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474507     Document Type: Conference Paper
Times cited : (28)

References (11)
  • 1
    • 0032633614 scopus 로고    scopus 로고
    • The accuracy of current model descriptions of a DUV photoresist
    • D. Kang, E.K. Pavelchek & C. Swible-Keane, "The accuracy of current model descriptions of a DUV photoresist", Proc. SPIE Vol. 3678, pp. 877-890 (1999).
    • (1999) Proc. SPIE , vol.3678 , pp. 877-890
    • Kang, D.1    Pavelchek, E.K.2    Swible-Keane, C.3
  • 3
    • 0001579854 scopus 로고    scopus 로고
    • Enhancing the development rate model for optimum simulation capability in the sub-half-micron regime
    • G. Arthur, B. Martin, C.A. Mack, "Enhancing the development rate model for optimum simulation capability in the sub-half-micron regime", Proc. SPIE Vol. 3049, p. 189 (1997).
    • (1997) Proc. SPIE , vol.3049 , pp. 189
    • Arthur, G.1    Martin, B.2    Mack, C.A.3
  • 4
    • 0034839897 scopus 로고    scopus 로고
    • Automatic calibration of lithography simulation parameters
    • S. Jug, R. Huang, J. Byers, C. Mack, "Automatic calibration of lithography simulation parameters", Proc. SPIE 4404, p. 380 (2001).
    • (2001) Proc. SPIE , vol.4404 , pp. 380
    • Jug, S.1    Huang, R.2    Byers, J.3    Mack, C.4
  • 5
    • 0032686458 scopus 로고    scopus 로고
    • Measurement of parameters for simulation of deep UV lithography using a FT-IR baking system
    • A. Sekiguchi, C.A. Mack, M. Isono, T. Matsuzawa, "Measurement of parameters for simulation of Deep UV Lithography using a FT-IR baking system", Proc. SPIE Vol. 3678, pp. 985-1000 (1999).
    • (1999) Proc. SPIE , vol.3678 , pp. 985-1000
    • Sekiguchi, A.1    Mack, C.A.2    Isono, M.3    Matsuzawa, T.4
  • 6
    • 0011191757 scopus 로고    scopus 로고
    • SOLID-C, SIGMA-C GmbH, Thomas-Dehler-Str. 9, 81737 München, Germany
    • SOLID-C, SIGMA-C GmbH, Thomas-Dehler-Str. 9, 81737 München, Germany.
  • 7
    • 0036030882 scopus 로고    scopus 로고
    • Impact of isofocal bias on MEEF management
    • C.R. Parker, M.T. Reuilly, "Impact of isofocal bias on MEEF management", Proc. SPIE Vol. 4690 (2002).
    • (2002) Proc. SPIE , vol.4690
    • Parker, C.R.1    Reuilly, M.T.2
  • 8
    • 0011191062 scopus 로고    scopus 로고
    • Automatic calibration of lithography simulation parameters using multiple data sets
    • C. Mack, J. Byers, R. Huang, S. Jug, "Automatic calibration of lithography simulation parameters using multiple data sets", MNE 2001.
    • (2001) MNE 2001
    • Mack, C.1    Byers, J.2    Huang, R.3    Jug, S.4
  • 9
    • 0030314809 scopus 로고    scopus 로고
    • Approximate models for resist process effects
    • T.A. Brunner and R.A. Ferguson, "Approximate models for resist process effects", Proc. SPIE 2726, pp. 198-207 (1996).
    • (1996) Proc. SPIE , vol.2726 , pp. 198-207
    • Brunner, T.A.1    Ferguson, R.A.2
  • 11
    • 0000752415 scopus 로고    scopus 로고
    • Optimizing the resist to the aerial image in a chemically amplified system
    • T.H. Fedynyshyn, C.R. Szamanda, and G.J. Cerniglario, "Optimizing the resist to the aerial image in a chemically amplified system", J. Vac. Sci. Technol. B 15 (1997) 2587.
    • (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 2587
    • Fedynyshyn, T.H.1    Szamanda, C.R.2    Cerniglario, G.J.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.