Experimental determination of lens aberrations from the intensity point-spread function in the focal region

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 I, Issue , 2003, Pages 1-10

  Dirksen, Peter ^a   Braat, Joseph ^b   Janssen, Augustus J E M ^a   Juffermans, Casper ^a   Leeuwestein, Ad ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Aberrations; Amplitude retrieval; Extended Nijboer Zernike theory; Optical lithography; Phase retrieval; Point spread function

Indexed keywords

LITHOGRAPHY; MASKS; OPTICAL INSTRUMENT LENSES; OPTICAL TRANSFER FUNCTION; THREE DIMENSIONAL;

EXTENDED NIJBOER-ZERNIKE THEORY; FOCAL REGION; LENS ABERRATIONS; NUMERICAL APERTURE;

ABERRATIONS;

EID: 0141722513     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485388     Document Type: Conference Paper

References (11)

1. T.A. Brunner, "Impact of lens aberrations on optical lithography", Proceedings of the Microlithography Seminar Interface, 1996 p. 1
2. D.G. Flagello, H. van der Laan, J. van Schoot, I. Bouchoms, B. Geh, "Understanding systematic and random CD variations using predictive modelling techniques", Proceedings of the SPIE 3679, 1999 p. 162
3. C. Progler, D. Wheeler, "Optical lens specifications from the user's perspective", Proceedings of the SPIE 3334, 1998, p.256
4. D. G. Flagello, B. Geh, "Lithographic lens testing: analysis of measured aerial images, inteferometric data and photo resist measurements", Proceedings of the SPIE 2726, 1996, p.788
5. A.J.E.M. Janssen, "Extended Nijboer-Zernike approach for the computation of optical point-spread functions", JOSA A 19, 2002, p. 849
6. J.J.M. Braat, P. Dirksen, A.J.E.M. Janssen, "Assessment of an extended Nijboer-Zernike approach for the computation of optical point-spread functions", JOSA A 19, 2002, p. 858
7. N.R. Farrar, A.L. Smith, D. Busath, D. Taitano, "In-situ measurement of lens aberrations", Proceedings of the SPIE 4000, 2000, p. 18
8. J.P. Kirk, T.A. Brunner, "Measurement of microlithography aerial image quality", Proceedings of the SPIE 2726, 1996, p. 410
9. P. Dirksen, C. Juffermans, A. Engelen, P. De Bisschop, H. Muellerke, "Impact of high order aberrations on the performance of the aberration monitor", Proceedings of the SPIE 4000, 2000, p.9
10. F. Zach, C.Y. Lin, J.P. Kirk, "Aberration analysis using reconstructed aerial images of isolated contacts on attenuated phase-shift masks", Proceedings of the SPIE 4346, 2001 p. 1362
11. P. Dirksen, J. Braat, A.J.E.M. Janssen, C. Juffermans, "Aberration retrieval using the extended Nijboer-Zernike approach", J. Microlith. Microfab., Microsyst., 2, 2003, p. 61