Strategy for sub-80nm contact holes patterning considering device fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 196-204

  Yoon, Jin Young ^a   Hata, Mitsuhiro ^a   Hah, Jung Hwan ^a   Kim, Hyun Woo ^a   Woo, Sang Gyun ^a   Cho, Han Ku ^a   Han, Woo Sung ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

ArF lithography; ArF RELACS; ArF SAFIER; ArF thermal flow; Sub 80nm contact holes

Indexed keywords

CHARACTERIZATION; FABRICATION; HEAT TRANSFER; IMAGE QUALITY; MASKS; SEMICONDUCTING FILMS; SILICON WAFERS;

CONTACT HOLES; PHOTORESIST FILMS; PROCESS ERROR FACTOR (PEF); THERMAL FLOW;

PHOTORESISTS;

EID: 3843054539     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534811     Document Type: Conference Paper

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