Advanced RELACS technology for ArF resist

Journal of Photopolymer Science and Technology

Volumn 16, Issue 4, 2003, Pages 507-510

  Terai, Mamoru ^a   Toyoshima, Toshiyuki ^a   Ishibashi, Takeo ^a   Tarutani, Shinji ^a   Takahashi, Kiyohisa ^a   Takano, Yusuke ^a   Tanaka, Hatsuyuki ^a  

^a NONE

Author keywords

193nm lithography; Contact hole pattern; Photoacid Generator; RELACS ; Shrink Technology

Indexed keywords

POLYMER;

ARTICLE; CHEMICAL PROCEDURES; COST EFFECTIVENESS ANALYSIS; GENERATOR; GEOMETRY; LITHOGRAPHY; METHODOLOGY; PROCESS TECHNOLOGY; TECHNIQUE;

EID: 0038507240     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.507     Document Type: Article

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