Solutions for printing sub 100 nm contacts with ArF

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691, Issue 1, 2002, Pages 503-514

  Gräupner, Paul ^a   Göhnermeier, Aksel ^a   Lowisch, Martin ^a   Garreis, Reiner ^a   Flagello, Donis ^b   Hansen, Steve ^b   Socha, Robert ^b   Köhler, Carsten ^a  

^a CARL ZEISS SMT AG   (Germany)

^b ASM Lithography ^*  (Germany)

Author keywords

Contacts; Pupil filtering; Tri tone

Indexed keywords

CONTACT LENSES; ELECTROMAGNETIC WAVE ATTENUATION; LIGHT TRANSMISSION; OPTICAL FILTERS; OPTICAL TRANSFER FUNCTION; PHASE SHIFT; PRINTING;

PHASE SHIFTING MASKS;

MASKS;

EID: 0036411691     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474569     Document Type: Article

References (6)

1. C.A.Mack, Microlithography World, pg. 20, May 2001.
2. D. Kang, S. Robertson, M. Reilly, E. Pavelchek, Proc. SPIE, 4404, 170 (2001).
3. Z.M. Ma et al. "Preventing sidelobe printing in applying attenuated phase shift reticles", SPIE, 3334, (1998).
4. R. Socha et al., "Design of 200nm, 170nm, 140nm DUV contact sweeper high transmission attenuated phase shift mask through simulation", SPIE, 3546, (1998).
5. R. von Bünau, G. Owen, and R.F.W. Pease, "Depth of focus enhancement in optical lithography", Vac. Sci. Technol. B 10, 3047 (1992).
6. H. Fukuda, Y. Kobayashi, T. Tawa, and S. Okazaki, "Performance of pupil filtering stepper-lens system", Microelectric Engineering 27, 213 (1995).