Localization of He induced nanovoids in buried Si1-xGe x thin films

Journal of Applied Physics

Volumn 103, Issue 1, 2008, Pages

  D'Angelo, D ^a   Mirabella, S ^a   Bruno, E ^a   Terrasi, A ^a   Bongiorno, C ^b   Giannazzo, F ^b   Raineri, V ^b   Bisognin, G ^c   Berti, M ^c  

^a UNIVERSITY OF CATANIA   (Italy)

^b CNR IMM   (Italy)

^c UNIVERSITY OF PADOVA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

HELIUM; NUCLEATION; TRANSMISSION ELECTRON MICROSCOPY;

THERMAL ANNEALING; VOID FORMATION;

THIN FILMS;

EID: 38149035221     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2826994     Document Type: Article

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