Advanced SOI-MOSFETs with strained-Si channel for high speed CMOS - electron/hole mobility enhancement

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2000, Pages 210-211

  Mizuno, T ^a   Sugiyama, N ^a   Satake, H ^a   Takagi, S ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; HETEROJUNCTIONS; MOSFET DEVICES; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS;

SILICON GERMANIDE;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0033725596     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)