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Volumn 15, Issue 7, 2000, Pages 1449-1477

Voids in silicon by He implantation: From basic to applications

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ANNEALING; BINDING ENERGY; BUBBLE FORMATION; CONCENTRATION (PROCESS); CRYSTAL IMPURITIES; ELECTRON TRAPS; HELIUM; SEMICONDUCTING SILICON; SUPERSATURATION;

EID: 0034236071     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2000.0211     Document Type: Review
Times cited : (152)

References (69)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.