Characterization of boron carbonitride (BCN) thin films deposited by radiofrequency and microwave plasma enhanced chemical vapor deposition

American Journal of Applied Sciences

Volumn 5, Issue 6, 2008, Pages 736-741

  Mannan, Md Abdul ^a   Nagano, M ^a   Shigezumi, K ^a   Kida, T ^b   Hirao, N ^c   Baba, Y ^c  

^a SAGA UNIVERSITY   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

^c JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

Boron carbonitride thin film; FT IR; RF MW plasma CVD; Trimethylamine borane; XPS

Indexed keywords

EID: 38049160902     PISSN: 15469239     EISSN: 15543641     Source Type: Journal    
DOI: 10.3844/ajassp.2008.736.741     Document Type: Article

References (24)

1. 2N. Phys. Rev. B., 55: 10161-10164.
2. Kawaguchi, M., 1997. B/C/N materials based oil the graphite network. Adv. Mater., 9: 615-625.
3. Hegemann, D., R. Riedel and C. Oehr, 1999. Influence of single-source precursors on PACVD-derived boron carbonitride thin films. Thin Solid Films, 339: 154-159.
4. Hahn, J., M. Friedrich, R, Pintaske, M. Schaller, N. Kahl, D.R.T. Zahn and F. Richter, 1996. Cubic boron nitride films by d.c. and r.f. magnetron sputtering: layer characterization and process diagnostics. Diamond Relat. Mater., 5: 1103-1112.
5. Yuki, T., S. Umeda and T. Sugino, 2004. Electrical and optical characteristics of boron carbon nitride films synthesized by plasma-assisted chemical vapor deposition. Diamond Relat. Mater., 13: 1130-1134.
6. Mineo, M. and T. Satoh, 2001. Study of BCN compounds prepared by the chemical vapor deposition with dimethylamineborane. J. Mat. Sci., 36: 3925-3931.
7. Essafti, A., E. Ech-chamikh and J.L.G. Fierro, 2005. Structural and chemical analysis of amorphous B-N-C thin films deposited by RF sputtering. Diamond Relat. Mater., 14: 1663-1668.
8. Liu, L., Y. Wang, K. Feng, Y. Li, W. Li, C. Zhao and Y. Zhao, 2006. Preparation of boron carbon nitride thin films by radio frequency magnetron sputtering. Appl. Surf. Sci., 252: 4185-4189.
9. Zhang, C.Y., X.L. Zhong, J.B. Wang and G.W. Yang, 2003. Room-temperature growth of cubic nitride boron film by RF plasma enhanced pulsed laser deposition. Chem. Phys. Lett., 370: 522-527.
10. Pan, W.J., J. Sun, H. Ling, N. Xu, Z. F. Ying and J. D. Wu, 2003. Preparation of thin films of carbon-based compounds. Appl. Surf. Sci., 218: 297-304.
11. y thin films grown by dual ion beam sputtering. Thin Solid films, 515: 207-211.
12. 2 by microwave plasma-enhanced chemical vapor deposition. Appl. Surf. Sci., 240: 120-130.
13. Hasegawa, T., K. Yamamoto and Y. Kakudate, 2003. Influence of raw gases on B-C-N films prepared by electron beam excited plasma CVD. Diamond Relat. Mater., 12: 1045-1048.
14. Linss, V., S.E. Rodil, P. Reinke, M.G. Garnier, P. Oelhafen, U. Kreissig and F. Richter, 2004. Bonding characteristics of DC magnetron sputtered B-C-N thin films investigated by Fourier-transformed infrared spectroscopy and X-ray photoelectron spectroscopy. Thin Solid Films, 467: 76-87.
15. Gago, R., I. Jimenez, F. Agullo-Rueda, J.M. Albella, L.Zs. Czigany and J. Hultman, 2002. Transition from amorphous boron carbide to hexagonal boron carbon nitride thin films induced by nitrogen ion assistance. Appl. Phys., 92: 5177-5182.
16. Caretti, I., I. Jimenez and J.M. Albella, 2003. BCN films with controlled composition obtained by the interaction between molecular beams of B and C with nitrogen ion beams. Diamond Relat. Mater., 12: 1079-1083.
17. Tomasella, E., C. Meunier and S. Mikhailov, 2001. a-C:H thin films deposited by radio-frequency plasma: influence of gas composition on structure, optical properties and stress levels. Surf. Coat. Technol., 141: 286-296.
18. Uddin, M.N., I. Shimoyama, Y. Baba, T. Sekiguchi, K.G. Nath and M. Nagano, 2005. B-C-N hybrid synthesis by high-temperature ion implantation. Appl. Surf. Sci., 241: 246-249.
19. Chiang, C.I., O. Meyer and R.M.C. da Silva, 1996. The modification of mechanical properties and adhesion of boron carbide sputtered films by ion implantation. Nucl. Instrum. Methods B., 117: 408-414.
20. Perrone, A., A.P. Caricato, A. Luches, M. Dinescu, C. Ghica, V. Sandu and A. Andrei, 1998. Boron carbonitride films deposited by pulsed laser ablation. Appl. Surf. Sci., 133: 239-242.
21. Dinescu, M., A. Perrone, A.P. Caricato, L. Mirenghi, C. Gerardi, C. Ghica and L. Frunza, 1998. Boron carbon nitride films deposited by sequential pulses laser deposition. Appl. Surf Sci., 127-129: 692-696.
22. Polo, M.C., E. Martinez, J. Esteve and J.L. Andujar, 1998. Preparation of B-C-N thin films by r.f. plasma assisted CVD. Diamond Relat. Mater., 7: 376-379.
23. 2 atmosphere. Appl. Surf. Sci., 157: 135-144.
24. 2N thin films. Appl. Phys. Lett., 68: 2962-2964.