Preparation of boron carbon nitride thin films by radio frequency magnetron sputtering

Applied Surface Science

Volumn 252, Issue 12, 2006, Pages 4185-4189

  Liu, Lihua ^a,c   Wang, Yuxin ^b   Feng, Kecheng ^b   Li, Yingai ^a   Li, Weiqing ^a   Zhao, Chunhong ^a   Zhao, Yongnian ^a  

^a JILIN UNIVERSITY   (China)

^b CHANGCHUN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^c JILIN NORMAL UNIVERSITY   (China)

Author keywords

Boron carbon nitride thin films; Radio frequency magnetron sputtering

Indexed keywords

ARGON; CARBON NITRIDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAPHITE; MAGNETRON SPUTTERING; MOLECULAR STRUCTURE; STOICHIOMETRY; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

AR-N2 GAS MIXTURE; ATOMIC-LEVEL HYBRID; BORON CARBON NITRIDE THIN FILMS; RADIO FREQUENCY MAGNETRON SPUTTERING; SPUTTERING POWER;

BORON COMPOUNDS;

EID: 33748041992     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.06.025     Document Type: Article

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