Influence of raw gases on B-C-N films prepared by electron beam excited plasma CVD

Diamond and Related Materials

Volumn 12, Issue 3-7, 2003, Pages 1045-1048

  Hasegawa, Takeshi ^a   Yamamoto, Kazuhiro ^b   Kakudate, Yozo ^b  

^a JAPAN FINE CERAMICS CENTER   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

B C N; Bonding configurations; Hardness; Plasma CVD

Indexed keywords

COMPOSITION; ELECTRON BEAMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

RAW GASES;

THIN FILMS;

DIAMOND;

EID: 0038183938     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(03)00067-0     Document Type: Article

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