메뉴 건너뛰기




Volumn 29, Issue 1, 2008, Pages 102-105

Multiple-gate CMOS thin-film ransistor with polysilicon nanowire

Author keywords

CMOS; Multiple gate; Nanoscale; Nanowire; Thin film transistor (TFT); Vertical integration

Indexed keywords

CRYSTALLIZATION; GATES (TRANSISTOR); NANOWIRES; POLYSILICON; THIN FILM TRANSISTORS;

EID: 37549041289     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2007.911982     Document Type: Article
Times cited : (64)

References (19)
  • 1
    • 0033164586 scopus 로고    scopus 로고
    • Low-leakage germanium-seeded laterally-crystallized single-grain 100-nm TFTs for vertical integration applications
    • Jul
    • V. Subramanian, M. Toita, N. R. Ibrahim, S. J. Souri, and K. C. Saraswat, "Low-leakage germanium-seeded laterally-crystallized single-grain 100-nm TFTs for vertical integration applications," IEEE Electron Device Lett., vol. 20, no. 7, pp. 341-343, Jul. 1999.
    • (1999) IEEE Electron Device Lett , vol.20 , Issue.7 , pp. 341-343
    • Subramanian, V.1    Toita, M.2    Ibrahim, N.R.3    Souri, S.J.4    Saraswat, K.C.5
  • 3
    • 46049113542 scopus 로고    scopus 로고
    • Three dimensionally stacked NAND flash memory technology using stacking single crystal Si layers on ILD and TANOS structure for beyond 30 nm node
    • San Francisco, CA
    • S.-M. Jung, J. Jang, W. Cho, H. Cho, J. Jeong, Y. Chang, J. Kim, Y. Rah, Y. Son, J. Park, M.-S. Song, K.-H. Kim, J.-S. Lim, and K. Kim, "Three dimensionally stacked NAND flash memory technology using stacking single crystal Si layers on ILD and TANOS structure for beyond 30 nm node," in IEDM Tech. Dig., San Francisco, CA, 2006, pp. 37-40.
    • (2006) IEDM Tech. Dig , pp. 37-40
    • Jung, S.-M.1    Jang, J.2    Cho, W.3    Cho, H.4    Jeong, J.5    Chang, Y.6    Kim, J.7    Rah, Y.8    Son, Y.9    Park, J.10    Song, M.-S.11    Kim, K.-H.12    Lim, J.-S.13    Kim, K.14
  • 5
    • 0347960086 scopus 로고    scopus 로고
    • High-performance thin-film transistors fabricated using excimer laser processing and grain engineering
    • Apr
    • G. K. Guist and T. W. Sigmon, "High-performance thin-film transistors fabricated using excimer laser processing and grain engineering," IEEE Trans. Electron Devices, vol. 45, no. 4, pp. 925-932, Apr. 1998.
    • (1998) IEEE Trans. Electron Devices , vol.45 , Issue.4 , pp. 925-932
    • Guist, G.K.1    Sigmon, T.W.2
  • 6
    • 0032137394 scopus 로고    scopus 로고
    • Low-temperature single-crystal Si TFTs fabricated on Si films processed via sequential lateral solidification
    • Aug
    • M. A. Crowder, P. G. Carey, P. M. Smith, R. S. Sposili, H. S. Cho, and J. S. Im, "Low-temperature single-crystal Si TFTs fabricated on Si films processed via sequential lateral solidification," IEEE Electron Device Lett., vol. 19, no. 8, pp. 306-308, Aug. 1998.
    • (1998) IEEE Electron Device Lett , vol.19 , Issue.8 , pp. 306-308
    • Crowder, M.A.1    Carey, P.G.2    Smith, P.M.3    Sposili, R.S.4    Cho, H.S.5    Im, J.S.6
  • 7
    • 0035120897 scopus 로고    scopus 로고
    • A proposed single grain-boundary thin-film transistor
    • Jan
    • C. H. Oh and M. Matsumura, "A proposed single grain-boundary thin-film transistor," IEEE Electron Device Lett., vol. 22, no. 1, pp. 20-22, Jan. 2001.
    • (2001) IEEE Electron Device Lett , vol.22 , Issue.1 , pp. 20-22
    • Oh, C.H.1    Matsumura, M.2
  • 8
    • 0030128485 scopus 로고    scopus 로고
    • Low temperature poly-Si thin-film transistor fabrication by metal-induced lateral crystallization
    • Apr
    • S.-W. Lee and S.-K. Joo, "Low temperature poly-Si thin-film transistor fabrication by metal-induced lateral crystallization," IEEE Electron Device Lett., vol. 17, no. 4, pp. 160-162, Apr. 1996.
    • (1996) IEEE Electron Device Lett , vol.17 , Issue.4 , pp. 160-162
    • Lee, S.-W.1    Joo, S.-K.2
  • 9
    • 0141452032 scopus 로고    scopus 로고
    • A high-performance multichannel dual-gate poly-Si TFT fabricated by excimer laser irradiation on a floating a-Si thin film
    • Sep
    • I.-H. Song, S.-H. Kang, W.-J. Nam, and M.-K. Han, "A high-performance multichannel dual-gate poly-Si TFT fabricated by excimer laser irradiation on a floating a-Si thin film," IEEE Electron Device Lett., vol. 24, no. 9, pp. 580-582, Sep. 2003.
    • (2003) IEEE Electron Device Lett , vol.24 , Issue.9 , pp. 580-582
    • Song, I.-H.1    Kang, S.-H.2    Nam, W.-J.3    Han, M.-K.4
  • 10
    • 0025955121 scopus 로고
    • Polysilicon thin-film transistors with channel length and width comparable to or smaller than the grain size of the thin film
    • Jan
    • N. Yamauchi, J.-J. J. Hajjar, and R. Reif, "Polysilicon thin-film transistors with channel length and width comparable to or smaller than the grain size of the thin film," IEEE Trans. Electron Devices, vol. 38, no. 1, pp. 55-60, Jan. 1991.
    • (1991) IEEE Trans. Electron Devices , vol.38 , Issue.1 , pp. 55-60
    • Yamauchi, N.1    Hajjar, J.-J.J.2    Reif, R.3
  • 11
    • 0027695276 scopus 로고
    • Tenth-micron polysilicon thin-film transistors
    • Nov
    • R. K. Watts and J. T. C. Lee, "Tenth-micron polysilicon thin-film transistors," IEEE Electron Device Lett., vol. 14, no. 11, pp. 515-517, Nov. 1993.
    • (1993) IEEE Electron Device Lett , vol.14 , Issue.11 , pp. 515-517
    • Watts, R.K.1    Lee, J.T.C.2
  • 12
    • 0030378323 scopus 로고    scopus 로고
    • Short-channel amorphous-silicon thin-film transistors
    • Dec
    • C.-D. Kim and M. Matsumura, "Short-channel amorphous-silicon thin-film transistors," IEEE Trans. Electron Devices, vol. 43, no. 12, pp. 2172-2176, Dec. 1996.
    • (1996) IEEE Trans. Electron Devices , vol.43 , Issue.12 , pp. 2172-2176
    • Kim, C.-D.1    Matsumura, M.2
  • 13
    • 29244445531 scopus 로고    scopus 로고
    • A new polysilicon CMOS self-aligned double-gate TFT technology
    • Dec
    • Z. Xiong, H. Liu, C. Zhu, and J. K. O. Sin, "A new polysilicon CMOS self-aligned double-gate TFT technology," IEEE Trans. Electron Devices, vol. 52, no. 12, pp. 2629-2633, Dec. 2005.
    • (2005) IEEE Trans. Electron Devices , vol.52 , Issue.12 , pp. 2629-2633
    • Xiong, Z.1    Liu, H.2    Zhu, C.3    Sin, J.K.O.4
  • 16
    • 33646750382 scopus 로고    scopus 로고
    • High-performance metal-induced lateral-crystallization polysilicon thin-film transistors with multiple nanowire channels and multiple gates
    • May
    • Y.-C. Wu, T.-C. Chang, P.-T. Liu, C.-W. Chou, Y.-C. Wu, C.-H. Tu, and C.-Y. Chang, "High-performance metal-induced lateral-crystallization polysilicon thin-film transistors with multiple nanowire channels and multiple gates," IEEE Trans. Nanotechnol., vol. 5, no. 3, pp. 157-162, May 2006.
    • (2006) IEEE Trans. Nanotechnol , vol.5 , Issue.3 , pp. 157-162
    • Wu, Y.-C.1    Chang, T.-C.2    Liu, P.-T.3    Chou, C.-W.4    Wu, Y.-C.5    Tu, C.-H.6    Chang, C.-Y.7
  • 18
    • 0032202947 scopus 로고    scopus 로고
    • Application of plasma immersion ion implantation doping to low-temperature processed poly-Si TFTs
    • Nov
    • C.-F. Yeh, T.-J. Chen, C. Liu, J. Shao, and N. W. Cheung, "Application of plasma immersion ion implantation doping to low-temperature processed poly-Si TFTs," IEEE Electron Device Lett., vol. 19, no. 11, pp. 432-434, Nov. 1998.
    • (1998) IEEE Electron Device Lett , vol.19 , Issue.11 , pp. 432-434
    • Yeh, C.-F.1    Chen, T.-J.2    Liu, C.3    Shao, J.4    Cheung, N.W.5
  • 19
    • 33847735448 scopus 로고    scopus 로고
    • Bandstructure and orientation effects in ballistic Si and Ge nanowire FETs
    • Washington, DC
    • J. Wang, A. Rahman, G. Klimeck, and M. Lundstrom, "Bandstructure and orientation effects in ballistic Si and Ge nanowire FETs," in IEDM Tech. Dig., Washington, DC, 2005, pp. 530-533.
    • (2005) IEDM Tech. Dig , pp. 530-533
    • Wang, J.1    Rahman, A.2    Klimeck, G.3    Lundstrom, M.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.