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Volumn 4, Issue 1, 2007, Pages 168-176

High-resolution soft lithography of thin film resists enabling nanoscopic pattern transfer

(4) Moran, Isaac W a Cheng, Dalton F a Jhaveri, Sarav B a Carter, Kenneth R a

a UNIVERSITY OF MASSACHUSETTS (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; GOLD; LITHOGRAPHY; PHOTOPOLYMERS; POLYDIMETHYLSILOXANE; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

FUNCTIONAL MATERIALS; NANOSCOPIC PATTERN TRANSFER;

THIN FILMS;

EID: 37149042587 PISSN: 1744683X EISSN: 17446848 Source Type: Journal
DOI: 10.1039/b711506g Document Type: Article

Times cited : (20)

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