High power sources for EUV lithography - State of the art

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5448, Issue PART 2, 2004, Pages 722-736

  Stamm, Uwe ^a   Kleinschmidt, Jürgen ^a   Gäbel, Kai ^b   Birner, Henry ^b   Ahmad, Imtiaz ^a   Bolshukhin, Denis ^a   Brudermann, Jesko ^a   Chinh, Tran Duc ^a   Flohrer, Frank ^b   Götze, Sven ^a   Hergenhan, Guido ^b   Klöpfel, Diethard ^b   Korobotchko, Vladimir ^a   Mader, Björn ^a   Müller, Rainer ^a   Ringling, Jens ^a   Schriever, Guido ^a   Ziener, Christian ^b  

^a XTREME Technologies   (Germany)

^b XTREME Technologies   (Germany)

Author keywords

EUV lithography; EUV source; Gas discharge produced plasma; Laser produced plasma

Indexed keywords

IMAGING SYSTEMS; INTEGRATED CIRCUITS; LASER PRODUCED PLASMAS; LIGHT SOURCES; MATHEMATICAL MODELS; MIRRORS; OPTIMIZATION; SEMICONDUCTING SILICON; THROUGHPUT; TRANSISTORS; ULTRAVIOLET RADIATION; XENON;

EUV LITHOGRAPHY; EUV SOURCES; GAS DISCHARGE PRODUCED PLASMAS (GDPP); LASER POWER;

PHOTOLITHOGRAPHY;

EID: 19944429774     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.548385     Document Type: Conference Paper

References (11)

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