Characterization of the tin-doped droplet laser plasma EUVL sources for HVM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Takenoshita, Kazutoshi ^a   George, Simi A ^a   Schmid, Tobias ^a   Koay, Chiew Seng ^a,c   Cunado, Jose ^a   Bernath, Robert ^a   Brown, Christopher ^a   Al Rabban, Moza M ^b   Silfvast, William T ^a   Richardson, Martin C ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b QATAR UNIVERSITY   (Qatar)

^c IBM   (United States)

Author keywords

Debris mitigation; Droplet plasma; EUV sources; High power EUV source; Out of band radiation

Indexed keywords

DEBRIS MITIGATION; DROPLET PLASMAS; EUV SOURCES; HIGH POWER EUV SOURCES; OUT OF BAND RADIATION;

DOPING (ADDITIVES); LASER PRODUCED PLASMAS; LIGHT SOURCES; TIN;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148853116     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713461     Document Type: Conference Paper

References (25)

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