A study of damage mechanism during EUV mask substrate cleaning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Rastegar, Abbas ^a   Eichenalub, Sean ^a   Goncher, Kurt ^a   Marmillion, Pat ^b  

^a SEMATECH   (United States)

^b IBM   (United States)

Author keywords

Damage; Defect generation; EUV; Glass cleaning; Mask cleaning; Mask substrate

Indexed keywords

DEFECT GENERATION; EXTREME ULTRAVIOLET (EUV); GLASS CLEANING; MASK CLEANING; MASK SUBSTRATE;

CLEANING; DEFECTS; GLASS; OPTIMIZATION; ULTRAVIOLET RADIATION;

MASKS;

EID: 33748072115     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681841     Document Type: Conference Paper

References (0)