A pixel-based regularization approach to inverse lithography

Microelectronic Engineering

Volumn 84, Issue 12, 2007, Pages 2837-2852

  Poonawala, Amyn ^a   Milanfar, Peyman ^a  

^a University of California Santa Cruz   (United States)

Author keywords

Inverse lithography; Low complexity; Non linear programming; OPC; Optimization; Pixel based approach; PSM; Regularization

Indexed keywords

IMAGING SYSTEMS; ITERATIVE METHODS; MASKS; OPTIMIZATION; PHASE SHIFT; PHOTOGRAMMETRY;

IMAGE CONTRAST; INVERSE LITHOGRAPHY; LOW COMPLEXITY; PIXEL BASED APPROACH; REGULARIZATION;

PIXELS;

EID: 36148971652     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.02.005     Document Type: Article

References (48)

1. International technology roadmap for semiconductors, (2003).
2. C. Ahn, H. Kim, K. Baik, Optical Microlithography, Proc. SPIE, vol. 3334, 1998, pp. 752-763.
3. Berman P., Kahng A.B., Vidhani D., Wang E.H., and Zelikovsky F.A. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems 19 (2000) 175-187
4. Bjorkholm J. Intel Technology Journal Q3 (1998) 8
5. Born M., and Wolfe E. Principles of Optics (1999), Cambridge University Press
6. Choudhury P. Handbook of Microlithography, Micromachining and Microfabrication (1997), SPIE Press
7. N. Cobb, A. Zakhor, Optical Microlithography, Proc. SPIE, vol. 2440, 1995, pp. 313-327.
8. N. Cobb, A. Zakhor, BACUS Symposium on Photomask Technology, Proc. SPIE, vol. 2621, 1995, pp. 534-545.
9. Duch W., and Jankowski N. Computing Surveys 2 (1999) 163-213
10. A. Erdmann, R. Farkas, T. Fuhner, B. Tollkuhn, G. Kokai, Optical Microlithography, Proc. SPIE, vol. 5377, 2004, pp. 646-657.
11. Farsiu S., Robinson D., Elad M., and Milanfar P. IEEE Transaction on Image Processing 13 (2004) 1327-1344
12. Fritze M., Tyrrell B., Astolfi D., Lambert R., Yost D., Forte A., Cann S., and Wheeler B. Lincoln Laboratory Journal 14 (2003) 237-250
13. Y. Granik, Optical Microlithography, Proc. SPIE, vol. 5754, 2005, pp. 506-526.
14. W. Huang, C. Lin, C. Kuo, C. Huang, J. Lin, J. Chen, R. Liu, Y. Ku, B. Lin, Optical Microlithography, Proc. SPIE, vol. 5377, 2001, pp. 1536-1543.
15. C.T. Kelly, Iterative Methods of Optimization, SIAM, (1999).
16. Liebmann L., Mansfield S., Wong A., Lavin M., Leipold W., and Dunham T. IBM Journal of Research and Development 45 (2001) 651-665
17. Y. Liu, D. Abrams, L. Pang, Andrew Moore, BACUS Symposium on Photomask Technology, Proc. SPIE, vol. 5992, 2005, pp. 231-238.
18. Liu Y., and Zakhor A. IEEE Transactions on Semiconductor Manufacturing 5 (1992) 138-151
19. Liu Y., and Zakhor A. IEEE Transaction on Semiconductor Manufacturing 9 (1996) 170-184
20. Mack C. Journal of Electrochemical Society 134 (1987) 148-152
21. C. Mack, Optical Microlithography, Proc. SPIE, vol. 5374, 2004, pp. 1-8.
22. A. Moore, T. Lin, Y. Liu, G. Russell, L. Pang, D. Abrams, BACUS Symposium on Photomask Technology, Proc. SPIE, vol. 6349, 2006.
23. Nashold K., and Saleh B. Journal of Optical Society of America A - Optics Image Science and Vision 2 (1985) 635-643
24. Y. Oh, J.C. Lee, S. Lim, Optical Microlithography, Proc. SPIE, vol. 3679, 1999, pp. 607-613.
25. S. Owa and H. Nagasaka, Optical Microlithography, Proc. SPIE, vol. 5040, 2003, pp. 724-733.
26. L. Pang, Y. Liu, D. Abrams, in: Sympoisum on Photomask and Next Generation Mask Technology VII, Proc. SPIE, vol. 6283, 2006.
27. Pati V.C., and Kailath T. Journal of Optical Society of America A - Optics Image Science and Vision 9 (1994) 2438-2452
28. Pati Y., Teolis A., Park D., Bass R., Rhee K.-W., Bradie B., and Peckerar M.C. Journal of Vaccum Science and Technology B 8 (1990) 1882-1988
29. Peckerar M.C., Chang S., and Marrian C.R.K. Journal of Vaccum Science and Technology B 13 (1995) 2518-2525
30. M.C. Peckerar and C.R.K. Marrian, Electron-Beam, X-Ray, EUV and Ion-Beam Submicrometer Lithographies for Manufacturing, Proc. SPIE, vol. 2437, 1995, pp. 222-238.
31. J. Peterson, Optical Microlithography, Proc. SPIE, vol. 4000, 2000, pp. 77-89.
32. A. Poonawala and P. Milanfar, Journal of Microlithography, Microfabrication and Microsystems (Preprint available online).
33. Poonawala A., and Milanfar P. IEEE Transactions on Image Processing 16 (2007) 774-788
34. A. Poonawala and P. Milanfar, Optical Microlithography, Proc. SPIE, vol. 6154, 2006, pp. 114-127.
35. J. Randall, K. Ronse, T. Marschner, M. Goethals, M. Ercken, Optical Microlithography, Proc. SPIE, vol. 3679, 1999, pp. 176-182.
36. S. Robertson, C. Mack, M. Maslow, Lithography for Semiconductor Manufacturing II, Proc. SPIE, vol. 4404, 2001, pp. 111-122.
37. Sayegh S., and Saleh B. IEEE Transaction on Pattern Analysis and Machine Intelligence 5 (1983) 441-445
38. Sayegh S., Saleh B., and Nashold K. IEEE Transaction on Acoustics, Speech and Signal Processing 33 (1985) 460-465
39. Schellenberg F. Future Fab. Intl. 9 (2000)
40. Schellenberg F. Resolution Enhancement Techniques in Optical Lithography (2004), SPIE Press
41. F. Schellenberg, Resolution enhancement technology: the past, the present, and extensions for the future, in: Bruce W. Smith(Ed.) Optical Microlithography, Proc. SPIE, vol. 5377, 2004, pp. 1-20.
42. Sherif S., Saleh B., and Leone R. IEEE Transactions on Image Processing 4 (1995) 1252-1257
43. Shin S., Han G., Ma Y., Moloni K., and Cerrina F. Journal of Vaccum Science and Technology B 19 (2001) 2890-2895
44. Vogel C. Computational Methods for Inverse Problems (2002), SIAM Press
45. Wilson R.G. Fourier Series and Optical Transform Techniques in Contemporary Optics (1995), Wiley
46. Wong A. IEEE Micro 23 (2003) 12-21
47. Wong A.K.-K. Resolution Enhancement Techniques in Optical Lithography (2001), SPIE Press
48. A. Poonawala, Y. Borodovsky, P. Milanfar, ILT for Double Exposure Lithography with Conventional and Novel Materials, Proceedings of the SPIE Advanced Lithography Symposium, Feb 2007.