Computer-aided phase shift mask design with reduced complexity

IEEE Transactions on Semiconductor Manufacturing

Volumn 9, Issue 2, 1996, Pages 170-181

  Liu, Yong ^a,b   Zakhor, Avideh ^c   Zuniga, Marco A ^c  

^a IEEE

^b CIDA Technology Inc   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER AIDED DESIGN; MASKS; OPTIMIZATION; PHASE SHIFT;

CONTACT HOLE; INTENSITY PATTERN; PHASE SHIFT MASK DESIGN;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030151364     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.492811     Document Type: Article

References (8)

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3. Y. Liu, A. K. Pfau, and A. Zakhor, "Systematic design of phase-shifting masks with extended depth of focus and/or shifted focus plane," in SPIE Symp. Optical/Laser Microlitho., vol. 1674-1602, Mar. 1992.
4. B. E. A. Saleh and S. I. Sayeh, "Reduction of errors of microphotographic reproduction by optimal corrections of original masks," Optical Eng., vol. 20, pp. 781-787, 1981.
5. C. Spence, A. Muray, P. Buck, and U. Quinto, "Manufacturing issues for OPC masks," Preprint, June 1994.
6. A. Starikov, "Use of a single size square serif for variable print compensation in microlithography; method, design and practice," in SPIE Symp. Optical/Laser Microlitho., vol. 1088, pp. 34-36, 1989.
7. T. Terasawa, N. Hasegawa, T. Hurosaki, and T. Tanaka, "0.3-micron optical lithography using a phase-shifting mask," in SPIE Symp. Optical/Laser Microlitho., vol. 1088, pp. 25-33, 1989.
8. T. Terasawa, N. Hasegawa, T. Tanaka, and S. Katagiri, "Improved resolution of an i-line stepper using a phase-shifting mask," J. Vacuum Sci. Technol., vol. B8, no. 6, pp. 1300-1348, Nov./Dec. 1990.