Simulation of the growth dynamics of amorphous and microcrystalline silicon

Journal of Non-Crystalline Solids

Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 32-36

  Bailat, J ^a   Vallat Sauvain, E ^a   Vallat, A ^a   Shah, A ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTALLINE MATERIALS; DESORPTION; FILM GROWTH; MATHEMATICAL MODELS; MOLECULAR BEAM EPITAXY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

CRYSTALLINE FRACTION; DYNAMICAL GROWTH MODEL; LOCAL RELAXATION; RANDOM DEPOSITION;

SILICON;

EID: 2942594132     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.02.016     Document Type: Conference Paper

References (9)

1. Shah A., Meier J., Vallat-Sauvain E., Wyrsch N., Kroll U., Droz C., Graf U. Solar Energ. Mater. Solar Cells. 78:2003;469.
2. Bailat J., Vallat-Sauvain E., Feitknecht L., Droz C., Shah A. J. Appl. Phys. 93:2003;5727.
3. Matsuda A. Thin Film Solids. 377:1999;1.
4. Tsai C.C. Amorphous Silicon and Related Materials. 1988;World Scientific.
5. Collins R.W., Ferlauto A.S., Ferreira G.M., Chen C., Joohyun K., Koval R.J., Yeeheng L., Pearce J.M., Wronski C.R. Solar Energ. Mater. Solar Cells. 78:2003;143.
6. Mates T., Fejfar A., Drbohlav I., Reze B., Fojtik P., Luterova K., Kocka J., Koch C., Schubert M.B., Ito M. J. Non-Cryst. Solids. 299-302:2002;767.
7. Barabasi A.L., Stanley H.E. Fractal Concepts in Crystal Growth. 1995;Cambridge University.
8. J. Meier, U. Kroll, S. Dubail, S. Golay, S. Faÿ, J. Dubail and A. Shah, in: Proceedings of the 28th IEEE Photovoltaic Specialists Conference, Anchorage, AK 2000, p. 746.
9. Benedict J., Anderson R., Klepeis S.J. MRS Symp. Proc. 254:1992;121.