Inverse lithography technology at low k1: Placement and accuracy of assist features

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 I, Issue , 2006, Pages

  Moore, Andrew ^a   Lin, Timothy ^a   Liu, Yong ^a   Russell, Gordon ^a   Pang, Linyong ^a   Abrams, Daniel ^a  

^a Luminescent Technologies Inc   (United States)

Author keywords

ILT; Inverse lithography technology; OPC; RET; SRAF

Indexed keywords

OPTICAL RESOLVING POWER; OPTICAL VARIABLES CONTROL; PATTERN RECOGNITION;

INVERSE LITHOGRAPHY TECHNOLOGY (ILT); OPC; RET; SRAF;

LITHOGRAPHY;

EID: 33846589378     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.693039     Document Type: Conference Paper

References (6)

1. Manakli, et al., "Optimization of the depth of focus based on the analysis of the diffraction orders in the pupil plane," Microelectronic Engineering 67-68., pp. 70-77 (2003)
2. Socha, et al., "Contact hole reticle optimization using interference mapping lithography (IMLtm)," Proc. SPIE vol. 5446 (2004) pp.516-524
3. Shang et al., "Model-based insertion and optimization of assist features with application to contact layers," Proc. SPIE vol. 5992 (2005) pp.1Y1-1Y10
4. Chu et al., "Enhancing DRAM Printing Process Window by Using Inverse Lithography Technology (ILT)," Proc. SPIE vol. 6154 (2006) pp.1231-1240
5. Pistor, T. V. and Socha, R. J., "Rigorous Electromagnetic Simulation of Stepper Alignment", Proc. SPIE vol. 4689 (2002) pp. 1045-1056
6. Balasinski et al., "Inverse lithography technology: verification of SRAM cell pattern," Proc. SPIE vol. 5992 (2005) pp. 881-885