Application of CPL with interference mapping lithography™ to generate random contact reticle designs for the 65nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5446, Issue PART 2, 2004, Pages 550-559

  Van Den Broeke, Douglas ^a   Laidig, Tom ^a   Chen, J Fung ^a   Wampler, Kurt ^a   Hsu, Stephen ^a   Shi, Xuelong ^a   Socha, Robert ^a   Dusa, Mircea ^a   Corcoran, Noel ^a  

^a ASML US Inc   (United States)

Author keywords

Assist features; CPL Technology; IML; Interference Mapping Lithography; Model OPC; Off axis illumination; PSM; QUASAR; Resolution enhancement technique

Indexed keywords

CHROMELESS PHASE LITHOGRAPHY (CPL); INTERFERENCE MAPPING LITHOGRAPHY (IML); OFF-AXIS ILLUMINATION; PSM; QUASAR; RESOLUTION ENHANCEMENT TECHNIQUE;

ALGORITHMS; ATTENUATION; AUTOMATION; IMAGING TECHNIQUES; MASKS; PHASE SHIFT; SEMICONDUCTOR MATERIALS;

LITHOGRAPHY;

EID: 11844272070     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557751     Document Type: Conference Paper

References (4)

1. 1 Full Pitch Range Contact Hole Patterning Using Chromeless Phase Lithography™", Proceeding of BACUS 2003, SPIE Vol. 5256, pp. 297-308, 2003
2. D. Van Den Broeke, et al., "Complex 2D pattern lithography at lambda/4 resolution using chromeless phase lithography (CPL)", Optical Microlithography XV, Proceeding of SPIE Vol. 4691, pp.196-214, 2002
3. 1 contact hole imaging with CPL™ technology", Photomask and Next-Generation Lithography Mask Technology XI, Proceedings of SPIE Vol. 5446-109, to be published (2004)
4. R. Socha, et al., "Contact hole reticle optimization by using interference mapping", Optical Microlithography XVII, Proceeding of SPIE Vol. 5377-20, to be published (2004)