Model-based placement and optimization of sub-resolution assist features

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 II, Issue , 2006, Pages

  Barnes, Levi D ^a   Painter, Benjamin D ^a   Melvin III, Lawrence S ^a  

^a SYNOPSYS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASK SITES; POST-PLACEMENT CORRECTIONS; SUB-RESOLUTION ASSIST FEATURES (SRAF); WAFER DATA;

CALIBRATION; HEURISTIC METHODS; MASKS; ROBUSTNESS (CONTROL SYSTEMS); TWO DIMENSIONAL;

PHOTOLITHOGRAPHY;

EID: 33745794871     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656691     Document Type: Conference Paper

References (5)

1. Smith, Bruce W., "Optics for Photolithography," in Microlithography, Bruce W. Smith, ed., Marcel Dekker, Inc, New York, 1998.
2. Melvin, L. S., III, J. P. Shiely, and Q. Yan, "Use of optical defocus components to investigate and improve pattern spatial frequency characteristics for more robust layouts," Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures - November 2005 - Volume 23, Issue 6, pp. 2631 -2635.
3. ™)," Proc. SPIE Vol. 5377, 2004, pp 222 through 233
4. G. Kunkel, R. Ziebold, "Method to improve the resolution of contact holes," Proc. SPIE, 5377, pp.241-54.
5. nd European Mask and Lithography Conference, VDE 49, January 2006, pp225-232,