Model-based insertion of assist features using pixel inversion method: Implementation in 65nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 II, Issue , 2006, Pages

  Hung, Chi Yuan ^a   Liu, Qingwei ^a   Sakajiri, Kyohei ^b   Shang, Shumay D ^b   Granik, Yuri ^b  

^a SEMICONDUCTOR MANUFACTURING INTERNATIONAL CORPORATION   (China)

^b MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASK INSPECTION; PIXEL INVERSION METHOD; SUB-RESOLUTION ASSIST FEATURE (SRAF);

COMPUTER SIMULATION; DATA ACQUISITION; LITHOGRAPHY; MASKS; MATHEMATICAL MODELS;

OPTICAL RESOLVING POWER;

EID: 33748031740     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681816     Document Type: Conference Paper

References (3)

1. Granik, "Solving inverse problems of optical microlithography", Proc. SPIE vol. 5754 (2005) pp. 506-526
2. Shang et al, "Model-based insertion and optimization of assist features with application to contact layers", Proc. SPIE vol. 5992 (2005) pp.
3. Smith et al, "OPC and image optimization using localized frequency analysis", Proc.SPIE vol.4691 (2002), pp.148-157