Detection signal analysis of actinic inspection of EUV mask blanks using dark-field imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Tanaka, Toshihiko ^a   Terasawa, Tsuneo ^a   Iriki, Nobuyuki ^a   Aoyama, Hajime ^a   Tomie, Toshihisa ^b  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Actinic inspection; Defect printability; EUV; Mask blanks; Multilayer; Noise; Phase defect; Surface roughness

Indexed keywords

DEFECTS; IMAGE ANALYSIS; MULTILAYERS; NUMERICAL METHODS; SIGNAL ANALYSIS; SIGNAL DETECTION; SPURIOUS SIGNAL NOISE; SURFACE ROUGHNESS;

ACTINIC INSPECTION; DEFECT PRINTABILITY; MASK BLANKS; PHASE DEFECTS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148868223     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711263     Document Type: Conference Paper

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