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Volumn 5992, Issue 2, 2005, Pages

Three dimensional EUV simulations - A new mask near field and imaging simulation system

Author keywords

3D EUV simulation; Jones pupil; Waveguide

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETIC FIELDS; IMAGING SYSTEMS; NATURAL FREQUENCIES; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

EID: 33644597120     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632071     Document Type: Conference Paper
Times cited : (30)

References (12)
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    • Schiavone, P.1    Granet, G.2    Robic, J.3
  • 2
    • 0034769038 scopus 로고    scopus 로고
    • Impact of the EUV mask phase response on the asymmetry of Bossung curves as predicted by rigorous EUV mask simulations
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    • Krautschik, C.1    Ito, M.2    Nishiyama, I.3    Olaki, K.4
  • 3
    • 0034757240 scopus 로고    scopus 로고
    • Quantifying EUV imaging tolerances for the 70, 50, and 35 nm nodes through rigorous aerial image simulations
    • Krautschik C., Ito M., Mori T., Quantifying EUV imaging tolerances for the 70, 50, and 35 nm nodes through rigorous aerial image simulations, Proc. SPIE 4343, 2001
    • (2001) Proc. SPIE , vol.4343
    • Krautschik, C.1    Ito, M.2    Mori, T.3
  • 4
    • 14844363029 scopus 로고
    • The finite-difference time-domain method
    • Boston
    • Tatlove A., The finite-difference time-domain method, ARTECH HOUSE, Boston, 1995
    • (1995) ARTECH HOUSE
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  • 5
    • 0141501326 scopus 로고    scopus 로고
    • Efficient simulation of light diffraction from 3-dimensional EUV-masks using field decomposition techniques
    • Erdmann A., Kalus C., Schmöller T., Wolter A., Efficient simulation of light diffraction from 3-dimensional EUV-masks using field decomposition techniques, Proc. SPIE 5037, 2003
    • (2003) Proc. SPIE , vol.5037
    • Erdmann, A.1    Kalus, C.2    Schmöller, T.3    Wolter, A.4
  • 6
    • 0036458888 scopus 로고    scopus 로고
    • Modification of boundaries conditions in the FDTD algorithm for EUV masks modeling
    • Vial A., Erdmann A., Schmoeller T., Kalus C., Modification of boundaries conditions in the FDTD algorithm for EUV masks modeling, Proc. SPIE 4754, 2002
    • (2002) Proc. SPIE , vol.4754
    • Vial, A.1    Erdmann, A.2    Schmoeller, T.3    Kalus, C.4
  • 9
    • 33644602979 scopus 로고    scopus 로고
    • The impact of EUV mask defects on lithographic process performance
    • Berlin, Offenbach
    • Evanschitzky P., Erdmann A., The impact of EUV mask defects on lithographic process performance, GMM-Fachbericht 43, VDE VERLAG GMBH, Berlin, Offenbach, 2004
    • (2004) GMM-Fachbericht 43, VDE VERLAG GMBH
    • Evanschitzky, P.1    Erdmann, A.2
  • 10
    • 3843091564 scopus 로고    scopus 로고
    • Enhanced model for the efficient 2D and 3D simulation of defective EUV masks
    • Evanschitzky P., Erdmann A., Enhanced model for the efficient 2D and 3D simulation of defective EUV masks, Proc. SPIE 5374, 2004
    • (2004) Proc. SPIE , vol.5374
    • Evanschitzky, P.1    Erdmann, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.