Rigorous Simulation of defective EUV Multilayer Masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 2, 2003, Pages 1239-1248

  Sambale, Christoph ^a   Schmoeller, Thomas ^a   Erdmann, Andreas ^b   Evanschitzky, Peter ^b   Kalus, Christian K ^a  

^a SIGMA C   (Germany)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

Defects; EUV masks; Lithography modeling

Indexed keywords

COMPUTER SIMULATION; FABRICATION; FINITE DIFFERENCE METHOD; LIGHT REFLECTION; MULTILAYERS; PHOTOLITHOGRAPHY; PRINTING; TIME DOMAIN ANALYSIS;

EXTREME ULTRA-VIOLET (EUV) MASKS; LITHOGRAPHY MODELING;

MASKS;

EID: 1842579513     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518049     Document Type: Conference Paper

References (8)

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