Sensitivity-limiting factors of at-wavelength EUVL mask blank inspection

Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference

Volumn 2005, Issue , 2005, Pages 80-81

  Tezuka, Yoshihiro ^a   Tanaka, Toshihiko ^a   Terasawa, Tsuneo ^a   Tomie, Toshihisa ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33745595181     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/imnc.2005.203747     Document Type: Conference Paper

References (1)

1. Y. Tezuka, M. Ito, T. Terasawa and T. Tomie: Proc. SPIE, 5374, (2004) p271.