New approach for realizing k1 = 0.3 optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3748, Issue , 1999, Pages 278-289

  Hasegawa, Masanobu ^a   Suzuki, Akiyoshi ^a   Saitoh, Kenji ^a   Yoshii, Minoru ^a  

^a CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR ANALYSIS; GATES (TRANSISTOR); PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

INNOVATIVE DOUBLE EXPOSURE BY ADVANCED LITHOGRAPHY EXPOSURE METHODS; MASK ERROR ENHANCEMENT FACTOR (MEF);

MASKS;

EID: 0032641992     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.360235     Document Type: Conference Paper

References (11)