Double exposure technique for 45nm node and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 1, 2005, Pages

  Hsu, Stephen ^a   Park, Jungchul ^a   Van Den Broeke, Douglas ^a   Chen, J Fung ^a  

^a ASML US Inc   (United States)

Author keywords

Coloring; Coloring line method (CLN); Coloring space method (CSP); CPL; DDL; DEL; DET; Double Dipole Lithography; Double exposure lithography; Double exposure technique; Double Pattering; FSB; Full sized SB; Model based layout conversion; SB; Scattering Bars

Indexed keywords

IMAGE ENHANCEMENT; LIGHT POLARIZATION; LIGHT SCATTERING; OPTICAL RESOLVING POWER; ULTRAVIOLET RADIATION;

COLORING LINE METHOD (CLN); COLORING SPACE METHOD (CSP); DOUBLE DIPOLE LITHOGRAPHY; DOUBLE EXPOSURE LITHOGRAPHY; DOUBLE EXPOSURE TECHNIQUE; DOUBLE PATTERING; FULL-SIZED SB; MODEL BASED LAYOUT CONVERSION; SCATTERING BARS;

PHOTOLITHOGRAPHY;

EID: 33644610615     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.633231     Document Type: Conference Paper

References (8)

1. Burn J. Lin, "Immersion lithography and its impact on semiconductor manufacturing" SPIE Vol. 5377, p 46-67, 2004
2. J. F. Chen, T. Laidig, K. Wampler, and R. Caldwell, "Optical proximity correction for intermediate-pitch features using sub-resolution scattering bars," J. Vac. Sci. Technol. B, vol. 15, pp 2426-2433, Nov. 1997
3. S. D. Hsu, et al, "Dipole Decomposition Mask-design for Full Chip Implementation at the 100nm Technology Node and beyond", SPIE Vol. 4691, p476-490 2002.
4. S. D. Hsu et al, "65-nm full-chip implementation using double dipole lithography". SPIE Vol. 5040, 2003
5. M. Eurling et al, "Experimental verification of a model based decomposition method for Double Dipole Lithography", SPIE Vol. 5377, 2004
6. S. D. Hsu, et al, "RET Integration of CPL™ Technology for Random Logic", SPIE Vol. 5377, p510-526, 2004
7. Konstantinos Adam, et al, "Polarization Effects in Immersion Lithography" SPIE Vol. 5377, p 329-343, 2004
8. Lars Liebmann, "Layout Methodology impact of Resolution Enhancement Technique", Electronic Design Process, Monterey, CA 2003