Enlarged atomic force microscopy scanning scope: Novel sample-holder device with millimeter range

Review of Scientific Instruments

Volumn 78, Issue 9, 2007, Pages

  Sinno, A ^a   Ruaux, P ^a   Chassagne, L ^a   Topu S ^a   Alayli, Y ^a   Lerondel, G ^b   Blaize, S ^b   Bruyant, A ^b   Royer, P ^b  

^a LABORATOIRE DES SCIENCES DU CLIMAT ET DE L ENVIRONNEMENT   (France)

^b UNIVERSITÉ DE TECHNOLOGIE DE TROYES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

MICROPROCESSOR CHIPS; MICROWAVE DEVICES; NEAR FIELD SCANNING OPTICAL MICROSCOPY; PIEZOELECTRIC ACTUATORS; SCANNING;

ACCURATE POSITIONING; INTEGRATED OPTICAL STRUCTURES; SAMPLE-HOLDER DEVICE; TOPOGRAPHICAL IMAGE;

ATOMIC FORCE MICROSCOPY;

EID: 34848913724     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2773623     Document Type: Article

References (31)

1. The International Technology Roadmap for Semiconductors Metrology report, 2005, http://www.itrs.net/Common/2005ITRS/Metrology2005.pdf
2. R. Bachelot, G. Lerondel, S. Blaize, S. Aubert, A. Bruyant, and P. Royer, Microsc. Res. Tech. 64, 441 (2004).
3. S. Blaise, S. Aubert, A. Bruyant, R. Bachelot, G. Lerondel, P. Royer, J. E. Broquin, and V. Minier, J. Microsc. 209, 588 (2003).
4. S. C. Minne, J. D. Adams, G. Yaralioglu, S. R. Manalis, A. Atalar, and C. F. Quate, Appl. Phys. Lett. 73, 1742 (1998).
5. H. Liu, B. Lu, Y. Ding, Y. Tang, and D. Li, J. Micromech. Microeng. 13, 295 (2003).
6. J. Fu, R. D. Young, and T. V. Vorburger, Rev. Sci. Instrum. 63, 2200 (1992).
7. H.-C. Yeh, W.-T. Ni, and S.-S. Pan, Control Eng. Pract. 13, 559 (2005).
8. M. Holmes, R. Hocken, and D. Trumper, Precis. Eng. 24, 191 (2000).
9. J. A. Kramar, Meas. Sci. Technol. 16, 2121 (2005).
10. G. Wilkening and L. Koenders, Nanoscale Calibration Standards and Methods, (Wiley-VCH, New York, 2005).
11. F. Meli and R. Thalmann, Meas. Sci. Technol. 9, 1087 (1998).
12. J. Haycocks and K. Jackson, Precis. Eng. 29, 168 (2005).
13. R. Leach, J. Haycocks, K. Jackson, A. Lewis, S. Oldfield, and A. Yaccot, Nanotechnology 12, R1 (2001).
14. S. Ducourtieux, S. Duhem, F. Larsonnier, J. Salgado, G. P. Vailleau, L. Lahousse, and J. David, in Proceedings of the 5th Euspen International Conference, Montpellier, France, (2005) Vol. 1, pp. 131-134.
15. C.-W. Lee and S.-W. Kim, Precis. Eng. 21, 113 (1997).
16. J. Schneir, T. H. McWaid, J. Alexander, and B. P. Wilfley, J. Vac. Sci. Technol. B 12, 3561 (1994).
17. M. Bienias, S. Gao, K. Hasche, R. Seemann, and K. Thiele, Appl. Phys. A: Mater. Sci. Process. 66, 837 (1998).
18. G. B. Picotto and M. Pisani, Ultramicroscopy 86, 247 (2001).
19. S. Gonda, T. Doi, T. Kurosawa, Y. Tanimura, N. Hisata, T. Yamagishi, H. Fujimoto, and H. Yukawa, Rev. Sci. Instrum. 70, 3362 (1999).
20. J. Haycocks and K. Jackson, in Proceedings of the 2nd Euspen Conference, Torino, Italy, 2001, p. 392.
21. K. R. Koops and K. Dirscherl, in Proceedings of 3rd Euspen Conference, Eindhoven, The Netherlands, 2002, pp. 525-528.
22. W. Gao, Y. Arai, A. Shibuya, S. Kiyono, and C. H. Park, Precis. Eng. 30, 96 (2006).
23. S. Top̧u, L. Chassagne, D. Haddad, Y. Alayli, and P. Juncar, Rev. Sci. Instrum. 74, 4876 (2003).
24. S. Top̧u, L. Chassagne, Y. Alayli, and P. Juncar, Opt. Commun. 247, 133 (2005).
25. L. Chassagne, S. Topcu, Y. Alayli, and P. Juncar, Meas. Sci. Technol. 16, 1771 (2005).
26. K. Dirscherl, Ph.D. thesis, Technical University of Denmark, Lyngby, 2000.
27. C.-L. Hwang, Y.-M. Chen, and C. Jan, IEEE Trans. Control Syst. Technol. 13, 56 (2005).
28. N. Bobroff, Precis. Eng. 15, 33 (1993).
29. F. C. Demarest, Meas. Sci. Technol. 9, 1024 (1998).
30. Pacific Nanotechnology Inc., Nano-R atomic force microscope specifications, http://www.pacificnanotech.com/nano-r-spm.html
31. K. P. Birch and M. J. Downs, Metrologia 30, 155 (1993).