-
1
-
-
0005799421
-
Infrared multispectral detection using Si/SiGe quantum well infrared photodetectors
-
D. Krapf, B. Adoram, J. Shappir, A. Sa'ar, S. G. Thomas, J. L. Liu, and K. L. Wang, "Infrared multispectral detection using Si/SiGe quantum well infrared photodetectors," Appl. Phys. Lett., vol. 78, pp. 495-497, 2001.
-
(2001)
Appl. Phys. Lett
, vol.78
, pp. 495-497
-
-
Krapf, D.1
Adoram, B.2
Shappir, J.3
Sa'ar, A.4
Thomas, S.G.5
Liu, J.L.6
Wang, K.L.7
-
2
-
-
0036712177
-
Interdigitated Ge p-i-n photodetectors fabricated on a Si substrate using graded SiGe buffer layers
-
Sep
-
J. Oh, J. C. Campbell, S. G. Thomas, S. Bharatan, R. Thomas, C. Jasper, R. E. Jones, and T. E. Zirkle, "Interdigitated Ge p-i-n photodetectors fabricated on a Si substrate using graded SiGe buffer layers," IEEE J. Quanturn Electron., vol. 38, no. 9, pp. 1238-1241, Sep. 2002.
-
(2002)
IEEE J. Quanturn Electron
, vol.38
, Issue.9
, pp. 1238-1241
-
-
Oh, J.1
Campbell, J.C.2
Thomas, S.G.3
Bharatan, S.4
Thomas, R.5
Jasper, C.6
Jones, R.E.7
Zirkle, T.E.8
-
3
-
-
0141918441
-
A high-performance SiGe-Si multiple- quantum-well heterojunction phototransistor
-
Oct
-
Z. Pei, C. S. Liang, L. S. Lai, Y. T. Tseng, Y. M. Hsu, P. S. Chen, S. C. Lu, M. J. Tsai, and C. W. Liu, "A high-performance SiGe-Si multiple- quantum-well heterojunction phototransistor," IEEE Electron Device Lett., vol. 24, no. 10, pp. 643-645, Oct. 2003.
-
(2003)
IEEE Electron Device Lett
, vol.24
, Issue.10
, pp. 643-645
-
-
Pei, Z.1
Liang, C.S.2
Lai, L.S.3
Tseng, Y.T.4
Hsu, Y.M.5
Chen, P.S.6
Lu, S.C.7
Tsai, M.J.8
Liu, C.W.9
-
4
-
-
4444288553
-
Reduction of dark current in AlGaN - GaN Schottky-barrier photodetectors with alow-temperature-grown GaN cap layer
-
Sep
-
M. L. Lee, J. K. Sheu, Y. K. Su, S. J. Chang, W. C. Lai, and G. C. Chi, "Reduction of dark current in AlGaN - GaN Schottky-barrier photodetectors with alow-temperature-grown GaN cap layer," IEEE Electron Device Lett., vol. 25, no. 9, pp. 593-595, Sep. 2004.
-
(2004)
IEEE Electron Device Lett
, vol.25
, Issue.9
, pp. 593-595
-
-
Lee, M.L.1
Sheu, J.K.2
Su, Y.K.3
Chang, S.J.4
Lai, W.C.5
Chi, G.C.6
-
5
-
-
0342696572
-
The effect of surface segregation on the light-emission intensity of Si/SiGe/Si heterostructures
-
Jul
-
Y. Kimura, K. Nakagawa, and M. Miyao, "The effect of surface segregation on the light-emission intensity of Si/SiGe/Si heterostructures," Appl. Phys. Lett., vol. 73, no. 2, pp. 232-234, Jul. 1998.
-
(1998)
Appl. Phys. Lett
, vol.73
, Issue.2
, pp. 232-234
-
-
Kimura, Y.1
Nakagawa, K.2
Miyao, M.3
-
6
-
-
0344083350
-
Improving the performance of AlGaInP laser diode by oxide annealing
-
Oct
-
J. D. Hwang and C. Y. Lin, "Improving the performance of AlGaInP laser diode by oxide annealing," Jpn. J. Appl. Phys., vol. 42, no. 10A, pp. 1116-1118, Oct. 2003.
-
(2003)
Jpn. J. Appl. Phys
, vol.42
, Issue.10 A
, pp. 1116-1118
-
-
Hwang, J.D.1
Lin, C.Y.2
-
7
-
-
13444311922
-
Surface passivated function of GaAs MSM-PDs using photoelectrochemical oxidation method
-
Feb
-
C. T. Lee and H. Y. Lee, "Surface passivated function of GaAs MSM-PDs using photoelectrochemical oxidation method," IEEE Photon. Technol. Lett., vol. 17, no. 2, pp. 462-464, Feb. 2005.
-
(2005)
IEEE Photon. Technol. Lett
, vol.17
, Issue.2
, pp. 462-464
-
-
Lee, C.T.1
Lee, H.Y.2
-
8
-
-
0012669560
-
2/SiGe interface
-
Mar
-
2/SiGe interface," Jpn. J. Appl. Phys., vol. 37, no. 3B, pp. 1316-1319, Mar. 1998.
-
(1998)
Jpn. J. Appl. Phys
, vol.37
, Issue.3 B
, pp. 1316-1319
-
-
Ahn, C.G.1
Kang, H.S.2
Kwon, Y.K.3
Kang, B.4
-
9
-
-
0035399121
-
Effects of annealing time and Si cap layer thickness on the Si/SiGe/Si heterostructures thermal stability
-
Jul
-
F. Gao, Y. X. Lin, D. D. Huang, J. P. Li, D. Z. Sun, M. Y. Kong, Y P. Zeng, J. M. Li, and L. Y. Lin, "Effects of annealing time and Si cap layer thickness on the Si/SiGe/Si heterostructures thermal stability," J. Cryst. Growth, vol. 227/228, pp. 766-769, Jul. 2001.
-
(2001)
J. Cryst. Growth
, vol.227-228
, pp. 766-769
-
-
Gao, F.1
Lin, Y.X.2
Huang, D.D.3
Li, J.P.4
Sun, D.Z.5
Kong, M.Y.6
Zeng, Y.P.7
Li, J.M.8
Lin, L.Y.9
-
10
-
-
0000059047
-
Controlling threading dislocation densities in Ge on Si using graded SiGe layers and chemical-mechanical polishing
-
Apr
-
M. T. Currie, S. B. Samavedam, T. A. Langdo, C. W. Leitz, and A. Fitzgerald, "Controlling threading dislocation densities in Ge on Si using graded SiGe layers and chemical-mechanical polishing," Appl. Phys. Lett., vol. 72, no. 14, pp. 1718-1720, Apr. 1998.
-
(1998)
Appl. Phys. Lett
, vol.72
, Issue.14
, pp. 1718-1720
-
-
Currie, M.T.1
Samavedam, S.B.2
Langdo, T.A.3
Leitz, C.W.4
Fitzgerald, A.5
-
11
-
-
0009594704
-
Correlation between leakage current density and threading dislocation density in SiGe p-i-n diodes grown on relaxed graded buffer layers
-
Jan
-
L. M. Giovane, H. C. Luan, A. M. Agarwal, and L. C. Kimerling, "Correlation between leakage current density and threading dislocation density in SiGe p-i-n diodes grown on relaxed graded buffer layers," Appl. Phys. Lett., vol. 78, no. 4, pp. 541-543, Jan. 2001.
-
(2001)
Appl. Phys. Lett
, vol.78
, Issue.4
, pp. 541-543
-
-
Giovane, L.M.1
Luan, H.C.2
Agarwal, A.M.3
Kimerling, L.C.4
-
12
-
-
41749119542
-
-
J. Mitchell, D. Macdonald, A. Cuevas, and J. Cornish, Surface passivation of n- and p-type crystalline silicon wafers by amorphous silicon films, in Proc. ANZSES, p. 1-72 004.
-
J. Mitchell, D. Macdonald, A. Cuevas, and J. Cornish, "Surface passivation of n- and p-type crystalline silicon wafers by amorphous silicon films," in Proc. ANZSES, p. 1-72 004.
-
-
-
-
14
-
-
27144538031
-
0.2
-
Dec
-
0.2," Thin Solid Films, vol. 493, no. 1/2, pp. 203-206, Dec. 2005.
-
(2005)
Thin Solid Films
, vol.493
, Issue.1-2
, pp. 203-206
-
-
Hwang, J.D.1
Chang, W.T.2
Hseih, K.H.3
Yang, G.H.4
Wu, C.Y.5
Cheng, P.S.6
-
15
-
-
33846641121
-
Si-based metal-semiconductor-metal photodetectors with various design modifications
-
Jan
-
M. Li and W. A. Anderson, "Si-based metal-semiconductor-metal photodetectors with various design modifications," Solid State Electron., vol. 51, no. 1, pp. 94-101, Jan. 2007.
-
(2007)
Solid State Electron
, vol.51
, Issue.1
, pp. 94-101
-
-
Li, M.1
Anderson, W.A.2
-
16
-
-
0035959861
-
High-performance metal-semiconductor-metal photodetector with a thin hydrogenated amorphous silicon layer on crystalline silicon
-
L. H. Laih, W. C. Tsay, Y. A. Chen, T. S. Jen, R. H. Yuang, and J. W. Hong, "High-performance metal-semiconductor-metal photodetector with a thin hydrogenated amorphous silicon layer on crystalline silicon," Electron. Lett., vol. 37, pp. 1249-1250, 2001.
-
(2001)
Electron. Lett
, vol.37
, pp. 1249-1250
-
-
Laih, L.H.1
Tsay, W.C.2
Chen, Y.A.3
Jen, T.S.4
Yuang, R.H.5
Hong, J.W.6
-
17
-
-
0036948749
-
Very low surface recombination velocities on p- and n- type silicon wafers passivated with hydrogenated amorphous silicon films
-
S. Dauwe, J. Schmidt, and R. Hezel, "Very low surface recombination velocities on p- and n- type silicon wafers passivated with hydrogenated amorphous silicon films," in Proc. 29th IEEE Photovolt. Spec. Conf. 2002, vol. 1, pp. 1-4.
-
(2002)
Proc. 29th IEEE Photovolt. Spec. Conf
, vol.1
, pp. 1-4
-
-
Dauwe, S.1
Schmidt, J.2
Hezel, R.3
-
18
-
-
31144444730
-
Fermi level pinning on SiGe surface by inductively coupled plasma treatment
-
L. G. Kim, K. J. Choi, and J. L. Lee, "Fermi level pinning on SiGe surface by inductively coupled plasma treatment," J. Vac. Sci. Technol. B, Microelectron. Process Phenom., vol. 23, no. 2, pp. 495-498, 2005.
-
(2005)
J. Vac. Sci. Technol. B, Microelectron. Process Phenom
, vol.23
, Issue.2
, pp. 495-498
-
-
Kim, L.G.1
Choi, K.J.2
Lee, J.L.3
-
19
-
-
18344408667
-
Plasma assisted oxidation of SiGe layers at 500 °C: Interface characterization
-
C. Tételin, X. Wallart, L. Vescan, and J. P. Nys, "Plasma assisted oxidation of SiGe layers at 500 °C: Interface characterization," Appl. Surf. Sci., vol. 104/105, pp. 385-391, 1996.
-
(1996)
Appl. Surf. Sci
, vol.104-105
, pp. 385-391
-
-
Tételin, C.1
Wallart, X.2
Vescan, L.3
Nys, J.P.4
-
20
-
-
0031999298
-
Room temperature spectroscopy of SiGe/Si p-i-n photodiodes grown by selective epitaxy
-
Feb
-
A. Vonsovici, L. Vescan, R. Apetz, A. Koster, and K. Schmidt, "Room temperature spectroscopy of SiGe/Si p-i-n photodiodes grown by selective epitaxy," IEEE Trans. Electron Devices, vol. 45, no. 2, pp. 538-542, Feb. 1998.
-
(1998)
IEEE Trans. Electron Devices
, vol.45
, Issue.2
, pp. 538-542
-
-
Vonsovici, A.1
Vescan, L.2
Apetz, R.3
Koster, A.4
Schmidt, K.5
-
21
-
-
0346688018
-
Back-incident SiGe-Si multiple quantum-well resonant-cavity-enhanced photodetectors for 1.3-μm operation
-
Oct
-
C. Li, Q. Yang, H. Wang, J. Yu, Q. Wang, Y. Li, J. Zhou, H. Huang, and X. Ren, "Back-incident SiGe-Si multiple quantum-well resonant-cavity-enhanced photodetectors for 1.3-μm operation," IEEE Photon. Technol. Lett., vol. 12, no. 10, pp. 1373-1375, Oct. 2000.
-
(2000)
IEEE Photon. Technol. Lett
, vol.12
, Issue.10
, pp. 1373-1375
-
-
Li, C.1
Yang, Q.2
Wang, H.3
Yu, J.4
Wang, Q.5
Li, Y.6
Zhou, J.7
Huang, H.8
Ren, X.9
-
22
-
-
0040284095
-
Density of states in the pseudo-gap of amorphous silicon-germanium alloys from electrical and optical measurements
-
Mar
-
T. Pisarkiewicz, A. Kolodziej, E. S. Osiowska, T. Stapinski, A. Rodzik, and P. Rava, "Density of states in the pseudo-gap of amorphous silicon-germanium alloys from electrical and optical measurements," Appl. Phys. Lett., vol. 60, no. 12, pp. 1465-1467, Mar. 1992.
-
(1992)
Appl. Phys. Lett
, vol.60
, Issue.12
, pp. 1465-1467
-
-
Pisarkiewicz, T.1
Kolodziej, A.2
Osiowska, E.S.3
Stapinski, T.4
Rodzik, A.5
Rava, P.6
-
23
-
-
0026156623
-
Interference-free determination of the optical absorption coefficient and the optical gap of amorphous silicon thin films
-
May
-
Y. Hishika, N. Nakamura, S. Tsuda, S. Nakano, Y. Kishi, and Y. Kuwano, "Interference-free determination of the optical absorption coefficient and the optical gap of amorphous silicon thin films," Jpn. J. Appl. Phys., vol. 30, no. 5, pp. 1008-1014, May 1991.
-
(1991)
Jpn. J. Appl. Phys
, vol.30
, Issue.5
, pp. 1008-1014
-
-
Hishika, Y.1
Nakamura, N.2
Tsuda, S.3
Nakano, S.4
Kishi, Y.5
Kuwano, Y.6
-
24
-
-
0024645549
-
x contact for application in an infrared image sensor
-
Apr
-
x contact for application in an infrared image sensor," Jpn. J. Appl. Phys., vol. 28, no. 4, pp. L544-L546, Apr. 1989.
-
(1989)
Jpn. J. Appl. Phys
, vol.28
, Issue.4
-
-
Kanaya, H.1
Hasegawa, F.2
Yamaka, E.3
Moriyama, T.4
Nakajima, M.5
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