Optimized fabrication of silicon nanofocusing x-ray lenses using deep reactive ion etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 5, 2007, Pages 1626-1629

  Kurapova, O ^a   Lengeler, B ^a   Schroer, C G ^b   Kuchler M ^c   Gessner, T ^c   Van Der Hart, A ^d  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^c FRAUNHOFER IZM   (Germany)

^d FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ELECTRON BEAM LITHOGRAPHY; LENSES; OPTIMIZATION; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; X RAY APPARATUS;

FIDELITY; SILICON NANOFOCUSING LENSES;

SILICON;

EID: 34648824399     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2769361     Document Type: Article

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