Diffractive x-ray optics using production fabrication methods

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 1 SPEC., 2003, Pages 214-219

  Stein, A ^a   Jacobsen, C ^a   Evans Lutterodt, K ^b   Tennant, D M ^b   Bogart, G ^b   Klemens, F ^b   Ocola, L E ^b   Choi, B J ^c   Sreenivasan, S V ^d  

^a STONY BROOK UNIVERSITY   (United States)

^b AGERE SYSTEMS   (United States)

^c MOLECULAR IMPRINTS INC   (United States)

^d UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTIVE OPTICS; ELECTRON BEAM LITHOGRAPHY; MASKS; OPTICAL MICROSCOPY; PLASMA SOURCES; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON; SILICON WAFERS;

BRAGG-FRESNEL OPTICS; DEEP SILICON ETCHING TECHNIQUE; DIFFRACTIVE X-RAY OPTICS; ULTRAHIGH-RESOLUTION SOFT X RAY ZONE PLATE; ZONE PLATE;

X RAY OPTICS;

EID: 0037207704     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1537232     Document Type: Article

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