Diffusion barrier performance of nanoscale TaNx thin-film

Transactions of Nonferrous Metals Society of China (English Edition)

Volumn 17, Issue 4, 2007, Pages 733-738

  ZHOU, Ji cheng ^a   CHEN, Hai bo ^a   LI, You zhen ^a  

^a CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

Cu diffusion barrier; diffusion barrier property; reactive magnetron sputtering; TaNx nanoscale thin film

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; DIFFUSION BARRIERS; MAGNETRON SPUTTERING; MULTILAYER FILMS; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; TANTALUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

DIFFUSION BARRIER; DIFFUSION BARRIER PROPERTY; ROOT MEAN SQUARE (RMS);

THIN FILMS;

EID: 34548760725     PISSN: 10036326     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1003-6326(07)60165-4     Document Type: Article

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