Microstructure of amorphous tantalum nitride thin films

Thin Solid Films

Volumn 460, Issue 1-2, 2004, Pages 222-226

  Tsukimoto, S ^a   Moriyama, M ^a   Murakami, Masanori ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Amorphous materials; Electron microscopy; Grain boundary; Tantalum nitride

Indexed keywords

AMORPHOUS MATERIALS; DIFFUSION; GRAIN BOUNDARIES; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; SYNTHESIS (CHEMICAL); TANTALUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DEIONIZATION; DIFFUSION BARRIERS; SPUTTERING CONDITIONS; TANTALUM NITRIDE;

THIN FILMS;

EID: 2942585297     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.01.073     Document Type: Article

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