Analysis of organic contaminants on Si wafers with TXRF-NEXAFS

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 58, Issue 12, 2003, Pages 2245-2253

  Pepponi, G ^a   Beckhoff, B ^b   Ehmann, T ^c   Ulm, G ^b   Streli, C ^a   Fabry, L ^c   Pahlke, S ^c   Wobrauschek, P ^a  

^a TU WIEN   (Austria)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^c SILTRONIC AG   (Germany)

Author keywords

NEXAFS; Organic contamination on Si wafers; TXRF

Indexed keywords

BANDWIDTH; CONTAMINATION; IMPURITIES; INTEGRATED CIRCUITS; MOLECULAR ORIENTATION; MONOCHROMATORS; PHOTONS; QUALITY CONTROL; SILICON WAFERS; TRACE ELEMENTS;

ALIPHATIC CHAINS; CHEMICAL BINDING; ORGANIC CONTAMINANTS;

X RAY SPECTROSCOPY;

EID: 0346643726     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0584-8547(03)00217-9     Document Type: Conference Paper

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