Looking at trace impurities on silicon wafers with synchroton radiation

Analytical Chemistry

Volumn 74, Issue 23, 2002, Pages

  Baur, Katharina ^a   Brennan, Sean ^a   Pianetto, Piero ^a   Opila, Robert ^b  

^a STANFORD UNIVERSITY   (United States)

^b UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NONDESTRUCTIVE TECHNIQUES;

FLUORESCENCE; IMPURITIES; RADIATION; SILICON WAFERS; TRACE ELEMENTS;

CHEMICAL ANALYSIS;

METAL; OXIDE; SILICON; SILICON DIOXIDE;

CHEMICAL ANALYSIS; CHEMICAL PROCEDURES; CONTAMINATION; ENERGY; IMPLANTATION; INTEGRATED CIRCUIT; REVIEW; SURFACE PROPERTY; SYNCHROTRON RADIATION; TECHNOLOGY; THICKNESS; ARTICLE; SEMICONDUCTOR; STANDARD; SYNCHROTRON; X RAY;

SEMICONDUCTORS; SILICON; SURFACE PROPERTIES; SYNCHROTRONS; TRANSISTORS; X-RAYS;

EID: 0036895882     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Review

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