-
1
-
-
32644450889
-
-
J.-M. Baribeau, X. Wu, N. L. Rowell, and D. J. Lockwood, J. Phys.: Condens. Matter 18, R139 (2006).
-
(2006)
J. Phys.: Condens. Matter
, vol.18
, pp. 139
-
-
Baribeau, J.-M.1
Wu, X.2
Rowell N., L.3
Lockwood D., J.4
-
3
-
-
0003896332
-
-
Electronic Materials Series No. 6 edited by T. P.Pearsall (Wiley, Federal Republic of Germany
-
Quantum Semiconductor Devices and Technologies, Electronic Materials Series No. 6 edited by, T. P. Pearsall, (Wiley, Federal Republic of Germany, 2000).
-
(2000)
Quantum Semiconductor Devices and Technologies
-
-
-
5
-
-
33645647504
-
-
M. H. Liao, C.-Y. Yu, T.-H. Guo, C.-H. Lin, and C. W. Liu, IEEE Electron Device Lett. 27, 252 (2006).
-
(2006)
IEEE Electron Device Lett.
, vol.27
, pp. 252
-
-
Liao M., H.1
Yu, C.-Y.2
Guo, T.-H.3
Lin, C.-H.4
Liu C., W.5
-
6
-
-
0039105954
-
-
X. Z. Liao, J. Zou, D. J. H. Cockayne, J. Wan, Z. M. Liang, G. Jin, and K. L. Wang, Appl. Phys. Lett. 79, 1258 (2001).
-
(2001)
Appl. Phys. Lett.
, vol.79
, pp. 1258
-
-
Liao X., Z.1
Zou, J.2
Cockayne D. J., H.3
Wan, J.4
Liang Z., M.5
Jin, G.6
Wang K., L.7
-
7
-
-
79956045947
-
-
M. W. Dashiell, U. Denker, C. Muller, G. Costantini, C. Manzano, K. Kern, and O. G. Schmidt, Appl. Phys. Lett. 80, 1279 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.80
, pp. 1279
-
-
Dashiell M., W.1
Denker, U.2
Muller, C.3
Costantini, G.4
Manzano, C.5
Kern, K.6
Schmidt O., G.7
-
8
-
-
0035886182
-
-
J. Wan, Y. H. Luo, Z. M. Jiang, G. Jin, J. L. Liu, K. L. Wang, X. Z. Liao, and J. Zou, J. Appl. Phys. 90, 4290 (2001).
-
(2001)
J. Appl. Phys.
, vol.90
, pp. 4290
-
-
Wan, J.1
Luo Y., H.2
Jiang Z., M.3
Jin, G.4
Liu J., L.5
Wang K., L.6
Liao X., Z.7
Zou, J.8
-
9
-
-
8344269383
-
-
P.-S. Kuo, B.-C. Hsu, P.-W. Chen, P. S. Chen, and C. W. Liu, Electrochem. Solid-State Lett. 7, G201 (2004).
-
(2004)
Electrochem. Solid-State Lett.
, vol.7
, pp. 201
-
-
Kuo, P.-S.1
Hsu, B.-C.2
Chen, P.-W.3
Chen P., S.4
Liu C., W.5
-
10
-
-
0001087533
-
-
P. Boucaud, L. Wu, C. Guedj, F. H. Julien, I. Sajnes, Y. Campidelli, and L. Garchery, J. Appl. Phys. 80, 1414 (1996).
-
(1996)
J. Appl. Phys.
, vol.80
, pp. 1414
-
-
Boucaud, P.1
Wu, L.2
Guedj, C.3
Julien F., H.4
Sajnes, I.5
Campidelli, Y.6
Garchery, L.7
-
11
-
-
0001458853
-
-
C. W. Liu, Y. D. Tseng, M. Y. Chern, C. L. Chang, and J. C. Strum, J. Appl. Phys.. 85, 2124 (1999).
-
(1999)
J. Appl. Phys.
, vol.85
, pp. 2124
-
-
Liu C., W.1
Tseng Y., D.2
Chern M., Y.3
Chang C., L.4
Strum J., C.5
-
14
-
-
0036646016
-
-
A. Strohm, T. Voss, W. Frank, P. Laitinen, and J. Raisanen, Z. Metallkd. 93, 737 (2002).
-
(2002)
Z. Metallkd.
, vol.93
, pp. 737
-
-
Strohm, A.1
Voss, T.2
Frank, W.3
Laitinen, P.4
Raisanen, J.5
-
15
-
-
0242440207
-
-
P. H. Tan, K. Brunner, D. Bougeard, and G. Abstreiter, Phys. Rev. B 68, 125302 (2003).
-
(2003)
Phys. Rev. B
, vol.68
, pp. 125302
-
-
Tan P., H.1
Brunner, K.2
Bougeard, D.3
Abstreiter, G.4
-
19
-
-
34548651541
-
-
EMIS Datareviews Series No. 12, edited by E.Kasper (INSPEC, London
-
Silicon Germanium, EMIS Datareviews Series No. 12, edited by, E. Kasper, (INSPEC, London, 1995), p. 127.
-
(1995)
Silicon Germanium
, pp. 127
-
-
-
22
-
-
0000720022
-
-
C. W. Liu, M. H. Lee, M.-J. Chen, I. C. Lin, and C.-F. Lin, Appl. Phys. Lett. 76, 1516 (2000).
-
(2000)
Appl. Phys. Lett.
, vol.76
, pp. 1516
-
-
Liu C., W.1
Lee M., H.2
Chen, M.-J.3
Lin I., C.4
Lin, C.-F.5
-
23
-
-
26244441513
-
-
M. H. Liao, S. T. Chang, M. H. Lee, S. Maikap, and C. W. Liu, J. Appl. Phys. 98, 066104 (2005).
-
(2005)
J. Appl. Phys.
, vol.98
, pp. 066104
-
-
Liao M., H.1
Chang S., T.2
Lee M., H.3
Maikap, S.4
Liu C., W.5
-
24
-
-
33645664767
-
-
M. H. Liao, P.-S. Kuo, S.-R. Jan, S. T. Chang, and C. W. Liu, Appl. Phys. Lett. 88, 143509 (2006).
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 143509
-
-
Liao M., H.1
Kuo, P.-S.2
Jan, S.-R.3
Chang S., T.4
Liu C., W.5
-
25
-
-
0003760432
-
-
EMIS Datareviews Series No. 20, edited by R.Hull (INSPEC, London
-
Properties of Crystalline Silicon, EMIS Datareviews Series No. 20, edited by, R. Hull, (INSPEC, London, 1999).
-
(1999)
Properties of Crystalline Silicon
-
-
|