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Journal of Applied Physics

Volumn 85, Issue 4, 1999, Pages 2124-2128

Thermal stability of Si/Si1-x-yGexCy/Si quantum wells grown by rapid thermal chemical vapor deposition

(5) Liu, C W a Tseng, Y D a Chern, M Y a Chang, C L b Sturm, J C b

a NATIONAL TAIWAN UNIVERSITY (Taiwan)

b Princeton University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001458853 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.369513 Document Type: Article

Times cited : (13)

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