Nucleation behavior in electroless displacement deposition of metals on silicon from hydrofluoric acid solutions

Electrochimica Acta

Volumn 53, Issue 1, 2007, Pages 35-41

  Yae, Shinji ^a,b   Nasu, Noriaki ^a   Matsumoto, Kohei ^a   Hagihara, Taizo ^a   Fukumuro, Naoki ^a   Matsuda, Hitoshi ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Metal nanoparticles; n Si; Noble metal deposition; Photoelectrochemistry; Surface states

Indexed keywords

ELECTRODEPOSITION; HYDROFLUORIC ACID; NUCLEATION; PLATINUM; SILICON WAFERS;

METAL NANOPARTICLES; NOBLE METAL DEPOSITION; PHOTOELECTROCHEMISTRY; SURFACE STATES;

PRECIOUS METALS;

EID: 34548570933     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2007.04.058     Document Type: Article

References (35)

1. Zhang X.G. Electrochemistry of Silicon and its Oxide (2001), Kluwer Academic/Plenum Pub., New York, NY Ch. 6.3
2. Oskam G., Long J.G., Natarajan A., and Searson P.C. J. Phys. D: Appl. Phys. 31 (1998) 1927
3. Garrido P., Gómez E., and Vallés E. J. Electroanal. Chem. 441 (1998) 147
4. Morisawa K., Ishida M., Yae S., and Nakato Y. Electrochim. Acta 44 (1999) 3725
5. Cerisier M., Attenborough K., Fransaer J., Van Haesendonck C., and Celis J.-P. J. Electrochem. Soc. 146 (1999) 2156
6. Stiger R.M., Gorer S., Craft B., and Penner R.M. Langmuir 15 (1998) 790
7. Rashkova B., Guel B., Pötzschke R.T., Staikov G., and Lorenz W.J. Electrochim. Acta 43 (1998) 3021
8. Ziegler J.C., Wielgosz R.I., and Kolb D.M. Electrochim. Acta 45 (1999) 827
9. Yae S., Kitagaki M., Hagihara T., Miyoshi Y., Matsuda H., Parkinson B.A., and Nakato Y. Electrochim. Acta 47 (2001) 345
10. Nagahara L.A., Ohmori T., Hashimoto K., and Fujishima A. J. Vac. Sci. Technol. A 11 (1993) 763
11. Gorostiza P., Servat J., Morante J.R., and Sanz F. Thin Solid Films 275 (1996) 12
12. Gorostiza P., Allongue P., Díaz R., Morante J.R., and Sanz F. J. Phys. Chem. B 107 (2003) 6454
13. Gorostiza P., Kulandainathan M.A., Díaz R., Sanz F., Allongue P., and Morante J.R. J. Electrochem. Soc. 147 (2000) 1026
14. Chemla M., Homma T., Bertagna V., Erre R., Kubo N., and Osaka T. J. Electroanal. Chem. 559 (2003) 111
15. ten Kortenaar M.V., de Goeij J.J.M., Kolar Z.I., Frens G., Lusse P.J., Zuiddam M.R., and van der Drift E. J. Electrochem. Soc. 148 (2001) C28
16. Dubin V.M. J. Electrochem. Soc. 139 (1992) 1289
17. Lee M.K., Wang J.J., and Wang H.D. J. Electrochem. Soc. 144 (1997) 1777
18. Magagnin L., Maboudian R., and Carraro C. Electrochem. Solid-State Lett. 4 (2001) C5
19. Morinaga H., Suyama M., and Ohmi T. J. Electrochem. Soc. 141 (1994) 2834
20. Mouche L., Taradif F., and Derrien J. J. Electrochem. Soc. 142 (1995) 2395
21. Chyan O.M.R., Chen J.-J., Chien H.Y., Sees J., and Hall L. J. Electrochem. Soc. 143 (1996) 92
22. Homma T., Wade C.P., and Chidsey C.E.D. J. Phys. Chem. B 102 (1998) 7919
23. Yae S., Kawamoto Y., Tanaka H., Fukumuro N., and Matsuda H. Electrochem. Comm. 5 (2003) 632
24. Yae S., Tanaka H., Kobayashi T., Fukumuro N., and Matsuda H. Phys. Stat. Sol. (c) 2 (2005) 3476
25. Yae S., Kobayashi T., Kawagishi T., Fukumuro N., and Matsuda H. In: Schmuki P., et al. (Eds). Pits and Pores III: Formation, Properties and Significance for Advanced Materials, The Electrochemical Society Proceedings Series 2004-19 (2006), The Electrochemical Society, Pennington 141
26. Yae S., Kobayashi T., Kawagishi T., Fukumuro N., and Matsuda H. Sol. Energy 80 (2006) 701
27. In: Lide D.R. (Ed). CRC Handbook of Chemistry and Physics. 85th ed. (2004), CRC Press, Boca Raton, FL
28. In: Bard A.J., Parsons R., and Jordan J. (Eds). Standard Potentials in Aqueous Solution, IUPAC (1985), Marcel Dekker, New York
29. In: Massalski T.B., Okamoto H., Subramanian P.R., and Kacprzak L. (Eds). Binally Alloy Phase Diagrams. 2nd ed. (1996), Plus Updates, ASM International, Materials Park, OH
30. Gorostiza P., Servat J., Sanz F., and Morante J.R. Inst. Phys. Conf. Ser. 149 (1996) 293
31. Homma T., Kubo N., and Osaka T. Electrochim. Acta 48 (2003) 3115
32. Zhang X.G. Electrochemistry of Silicon and Its Oxide (2001), Kluwer Academic/Plenum Pub, New York, NY Ch. 7
33. Campbell S.A. The Science and Engineering of Microelectronic Fabrication. 2nd ed. (2001), Oxford Univ. Press, New York, NY Ch. 11.1 and 14.1
34. Kobayashi H., Asuha, Maida O., Takahashi M., and Iwasa H. J. Appl. Phys. 94 (2003) 7328
35. Lehmann V. Electrochemistry of Silicon (2002), Willy-VCH, Weinheim Ch. 2