Charge exchange processes during the open-circuit deposition of nickel on silicon from fluoride solutions

Journal of the Electrochemical Society

Volumn 147, Issue 3, 2000, Pages 1026-1030

  Gorostiza, Pau ^a   Kulandainathan, M Anbu ^a   Díaz, Raül ^a   Sanz, Fausto ^a   Allongue, Philippe ^b   Morante, Juan Ramon ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

^b Université Pierre et Marie Curie   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE TRANSFER; DISSOLUTION; ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; ION EXCHANGE; PH EFFECTS; SCANNING TUNNELING MICROSCOPY; SILICON;

CATHODIC REACTIONS; CHARGE EXCHANGE PROCESSES; CONDUCTION BAND; OPEN CIRCUIT DEPOSITION; POTENTIOSTATIC CONTROL;

NICKEL;

EID: 0343061052     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393308     Document Type: Article

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