Electrochemical characterization of the open-circuit deposition of platinum on silicon from fluoride solutions

Journal of Physical Chemistry B

Volumn 107, Issue 26, 2003, Pages 6454-6461

  Gorostiza, Pau ^a,b,c   Allongue, Philippe ^a   Díaz, Raül ^b   Morante, Joan Ramon ^b   Sanz, Fausto ^b  

^a Université Pierre et Marie Curie   (France)

^b UNIVERSITY OF BARCELONA   (Spain)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODEPOSITION; ELECTRODES; ETCHING; FLUORIDE MINERALS; OXIDATION; PLATINUM; SILICON;

OPEN CIRCUIT DEPOSITION;

ELECTROCHEMISTRY;

EID: 0038441854     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp030071v     Document Type: Article

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