Bonding structure of silicon oxynitride grown by plasma-enhanced chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 5 B, 2007, Pages 3202-3205

  Wong, C K ^a   Wong, Hei ^a   Filip, V ^a   Chung, P S ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Bonding structure; PECVD; Random bonding; Silicon oxynitride; X ray photoelectron spectroscopy

Indexed keywords

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICON NITRIDE; STOICHIOMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

BONDING STRUCTURE; RANDOM BONDING; SILICON OXYNITRIDE;

FILM GROWTH;

EID: 34547925696     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.3202     Document Type: Article

References (19)

1. H. Wong and H. Iwai: Microelectron. Eng. 83 (2006) 1867.
2. H. Wong, M. C. Poon, C.W. Kok, P. J. Chan, and V. A. Gritsenko: IEEE Trans. Electron Devices 50 (2003) 1941.
3. V. A. Gritsenko, H. Wong, R. W. M. Kwok, and J. B. Xu: J. Vac. Sci. Technol. B 21 (2003) 241.
4. H. Wong: Microelectron. Reliab. 42 (2002) 317.
5. C. R. Wong, H. Wong, C. W. Kok, and M. Chan: J. Cryst. Growth 288 (2006) 171.
6. H. Wong, V. Filip, C. K. Wong, and P. S. Chung: Microelectron. Reliab. 47 (2007) 1.
7. C. R. Wong, H. Wong, M. Chan, C. W. Kok, and H. P. Chan: Microelectron. Reliab. 46 (2006) 2056.
8. V. A. Gritsenko, R. W. M. Kwok, H. Wong, and J. B. Xu: J. Non-Cryst. Solids 297 (2002) 96.
9. J. P. Chang, M. L. Green, V. M. Donnelly, R. L. Opila, J. Eng, Jr., J. Sapjeta, P. J. Silverman, and B. Weir: J. Appl. Phys. 87 (2000) 4449.
10. J. W. Kim, H. W. Yeom, Y. D. Chung, K. Jeong, and C. N. Whang: Phys. Rev. B 66 (2002) 035312.
11. M. Klanjsek Gunde and M. Macek: Appl. Phys. A 74 (2002) 181.
12. S. Hasegawa, S. Sakamori, M. Futsudera, T. Inokuma, and Y. Kurata: J. Appl. Phys. 89 (2001) 2598.
13. I. Pereyra and M. I. Alayo: J. Non-Cryst. Solids 212 (1997) 225.
14. P. Temple-Boyer, B. Hajji, J. L. Alay, J. R. Morante, and A. Martinez: Sens. Actuators 74 (1999) 52.
15. R. Worhoff, A. Driessen, P. V. Lambeck, L. T. H. Hilderink, P. W. C. Linders, and Th. J. A. Popma: Sens. Actuators 74 (1999) 9.
16. C. Dominguez, J. A. Rodriguez, F. J. Munoz, and N. Zine: Vacuum 52 (1999) 395.
17. M. Modreanu and M. Gartner: J. Mol. Struct. 565-566 (2001) 519.
18. M. I. Alayo, I. Pereyra, W. L. Scopel, and M. C. A. Fantini: Thin Solid Films 402 (2002) 154.
19. S. Naskar, C. A. Bower, B. R. Stonee, and J. T. Glass: Appl. Phys. Lett. 87 (2005) 261907.