Structure of defects in silicon oxynitride films

Journal of Applied Physics

Volumn 89, Issue 5, 2001, Pages 2598-2605

  Hasegawa, S ^a   Sakamori, S ^a   Futatsudera, M ^a  

^a KANAZAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001352998     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1343895     Document Type: Article

References (13)

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