Plasma enhanced chemical vapor deposition silicon oxynitride optimized for application in integrated optics

Sensors and Actuators, A: Physical

Volumn 74, Issue 1, 1999, Pages 9-12

  Worhoff K ^a   Driessen, A ^a   Lambeck, P V ^a   Hilderink, L T H ^a   Linders, P W C ^a   Popma, Th J A ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN BONDS; INTEGRATED OPTICS; OPTICAL FIBER COUPLING; REFRACTIVE INDEX;

PROCESS OPTIMIZATION; SILICON OXYNITRIDE;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0142208637     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00325-2     Document Type: Article

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