Self-assembled monolayers as model substrates for atomic layer deposition

Materials Research Society Symposium Proceedings

Volumn 812, Issue , 2004, Pages 123-128

  Whelan, Caroline M ^a   Demas, Anne Cécile ^a   Schuhmacher, Jörg ^a   Carbonell, Laureen ^a   Maex, Karen ^a,b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; DIFFUSION; ELLIPSOMETRY; FLUORESCENCE; MATHEMATICAL MODELS; MORPHOLOGY; SELF ASSEMBLY; SILANES; SILICA; SUBSTRATES; TEMPERATURE PROGRAMMED DESORPTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION (ALD); BROMOUNDECYLTRICHLOROSILANE (BR-UTS); TEMPERATURE PROGRAMMED DESORPTION SPECTROSCOPY; X-RAY FLUORESCENCE (XRF);

MONOLAYERS;

EID: 12844277239     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-812-f2.2     Document Type: Conference Paper

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